Resist removing apparatus and method for removing resist

Abstract

A nozzle as a whole is formed into a cylindrical structure having a supply surface with a supply opening as a bottom surface, and the supply surface is narrower than a surface of a wafer main portion of a sectional recession wafer and has a shape that fits in the surface of the wafer main portion. Therefore, in a state where the center of the wafer main portion and the center of the supply surface coincide with each other in plan view, the nozzle is brought close to the surface of the wafer main portion of the sectional recession wafer, whereby the supply surface of the nozzle can be disposed in a close distance from the surface of the wafer main portion in a wafer inner space.

What is claimed is: 
     
         1 . A resist removing apparatus for a wafer having a main portion and a protruding peripheral portion that is formed along a periphery of said main portion and protrudes at a position higher than a surface of said main portion, in which a resist is formed on the surface of said main portion,
 said resist removing apparatus comprising   a nozzle having, as a bottom, a supply surface provided with a supply opening for an ozone solution in the center of said supply surface,   wherein said nozzle has a supply portion structure including said supply surface formed to face the surface of said main portion in a non-contact state without coming in contact with said protruding peripheral portion in a wafer inner space formed between said protruding peripheral portion and the surface of said main portion.   
     
     
         2 . The resist removing apparatus according to  claim 1 , wherein
 said nozzle as a whole is formed into a columnar structure having said supply surface with said supply opening as the bottom surface,   said supply portion structure includes an overall structure of said nozzle, and   said supply surface is narrower than the surface of said main portion and has a shape that fits in the surface of said main portion.   
     
     
         3 . The resist removing apparatus according to  claim 1 , wherein
 said nozzle has a lower portion formed in a columnar structure having said supply surface with said supply opening as the bottom surface,   said supply portion structure includes the structure of said lower portion, and   said supply surface is narrower than the surface of said main portion and has a shape that fits in the surface of said main portion.   
     
     
         4 . The resist removing apparatus according to  claim 1 ,
 wherein a constituent material for said nozzle is titanium.   
     
     
         5 . A method for removing a resist from a wafer having a main portion and a protruding peripheral portion that is formed along a periphery of said main portion and protrudes at a position higher than a surface of said main portion, in which a resist is formed on the surface of said main portion,
 said method for removing a resist comprising the steps of:   (a) preparing a nozzle having a supply surface provided with a supply opening for an ozone solution in the center of said supply surface, said nozzle having a supply portion structure including said supply surface formed to face the surface of said main portion in a non-contact state without coming in contact with said protruding peripheral portion in a wafer inner space formed between said protruding peripheral portion and the surface of said main portion,   (b) disposing said supply portion structure over the surface of said main portion such that a distance between said supply surface and the surface of said main portion is less than or equal to 1.0 mm in said wafer inner space; and   (c) supplying the ozone solution from said supply opening to remove said resist from the surface of said main portion.