US2015329412A1PendingUtilityA1

Display panel, method of manufacturing the same, and frit composition used in the display panel

Assignee: SAMSUNG DISPLAY CO LTDPriority: Jun 17, 2011Filed: Jul 24, 2015Published: Nov 19, 2015
Est. expiryJun 17, 2031(~4.9 yrs left)· nominal 20-yr term from priority
H10K 50/844H10K 50/8426H10K 59/8722C03C 8/14C03C 8/24C03C 3/21H10W 74/43H10W 76/48H10K 2101/00
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Claims

Abstract

Provided are display panel, method of manufacturing the same, and frit composition used in the display panel. A display panel comprising: a first substrate, a second substrate facing the first substrate and a frit bonding the first substrate and the second substrate together, wherein the frit has an optical density of more than about 0.0683 μm for laser light of any one wavelength in a wavelength range of about 760 to about 860 nm.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A method of manufacturing a display panel, the method comprising:
 preparing a first substrate and a second substrate;   coating a frit composition, which has an optical density of more than about 0.0683/μm for laser light of a wavelength of about 810 nm, on the second substrate;   stacking the first substrate on the frit composition; and   sintering the frit composition by irradiating the laser light of the wavelength of about 810 nm to the frit composition.   
     
     
         2 . The method of  claim 1 , wherein the irradiating of the laser light is performed with a power of about 12.5 to about 13.0 W. 
     
     
         3 . The method of  claim 1 , wherein the frit composition comprises vanadium-based mother glass and further comprising plasticizing the frit composition at a temperature of about 300 to about 500° C. and in a workspace in an atmosphere which contains about 30 to about 40% by volume of N 2 , after the coating of the frit composition. 
     
     
         4 . The method of  claim 1 , wherein the frit composition comprises bismuth-based mother glass, and, in the coating of the frit composition, a frit composition, which has an optical density of about 0.1567/μm or greater for the laser light of the wavelength of about 810 nm, is coated on the second substrate.

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