Lithographic printing system with placement corrections
Abstract
The technology disclosed relates to methods and devices that compensate for displacements in a pattern or deformations of a workpiece. In particular, this relates to using timing to compensate for displacements along a first axis along the scanning direction while using resampling, interpolation or a similar method to compensate for displacements along a second axis that is substantially orthogonal to the first axis. The scanning direction may be an actual direction of movement of the scanning head or it may be a direction perpendicular to an orientation of an image projected onto a workpiece.
Claims
exact text as granted — not AI-modifiedWe claim as follows:
1 . A method of inspecting a workpiece, the method including:
rotating a rotor assembly comprising two or more rotor arms over a workpiece, wherein the rotor arms extend from and rotate about a hub; relaying image information from a portion of a surface of the workpiece through relay optics located on one of the rotor arms and the hub to an optical analytical instrument.
2 . The method of claim 1 , wherein optical analytical instrument is stationary relative to the rotor arms.
3 . The method of claim 1 , further including:
determining flatness or smoothness of the workpiece with the image information relayed to the optical analytical instrument.
4 . The method of claim 1 , further including:
verifying pattern integrity for a pattern patterned on the workpiece from the image information relayed to the optical analytical instrument.
5 . The method of claim 1 , further including:
illuminating the portion of the workpiece by providing illumination from an illumination source near or at the hub and through the relay optics.
6 . A device for inspecting a workpiece, the device including:
a rotor assembly comprising two or more rotor arms extending from and configured to rotate about a hub; relay optics, located on one of the rotor arms and the hub, and configured to relay image information from a portion of a surface of the workpiece to an optical analytical instrument.
7 . The device of claim 6 , wherein the optical analytical instrument is stationary relative to the rotor arms.
8 . The device of claim 6 , further including:
a memory; a processor coupled to the memory; and a first module running on the processor that determines flatness or smoothness of the workpiece with image information relayed to the optical analytical instrument.
9 . The device of claim 6 , further including:
a memory; a processor coupled to the memory; and a first module running on the processor that verifies pattern integrity for a pattern patterned on the workpiece from image information relayed to the optical analytical instrument.
10 . The device of claim 6 , further including:
an illumination source near or at the hub providing illumination through the relay optics.Join the waitlist — get patent alerts
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