Substrate processing apparatus and substrate processing method

Abstract

One or plurality of correction information corresponding to one or plurality of spin chucks are acquired in advance for adjustment of a position of a substrate by an aligner and are stored in a memory. Each correction information indicates a position to be adjusted by the aligner when the substrate is transported from the aligner to each spin chuck by a transport mechanism in order for a center of the transported substrate to coincide with a rotational center of the spin chuck. The position of the substrate is adjusted by the aligner based on the correction information, corresponding to the spin chuck, stored in the memory before the substrate is transported to any one of the spin chucks from the aligner during processing for the substrate.

I/We claim: 
     
         1 . A substrate processing apparatus that performs processing on a substrate, comprising:
 one or plurality of substrate supporters that have preset reference positions and support the substrate;   a position adjustor that is configured to be capable of adjusting a position of the substrate that is carried in;   a transport device that is configured to be capable of transporting the substrate between the position adjuster and the one or plurality of substrate supporters;   a storage that stores one or plurality of correction information, corresponding to the one or plurality of substrate supporters, acquired in advance for the adjustment of the position of the substrate by the position adjustor; and   a controller that controls the position adjustor to adjust the position of the substrate before the substrate is transported from the position adjuster to one substrate supporter of the one or plurality of substrate supporters during the processing for the substrate based on correction information, corresponding to the one substrate supporter, of the one or plurality of correction information stored in the storage, wherein   each of the one or plurality of correction information indicates the position to be adjusted by the position adjustor when the substrate is transported from the position adjustor to each of the one or plurality of substrate supporters by the transport device in order for a center of the transported substrate to coincide with the reference position in the substrate supporter.   
     
     
         2 . The substrate processing apparatus according to  claim 1 , wherein
 each of the one or plurality of correction information includes a position with which the center of the substrate is to coincide in the position adjustor before the transportation of the substrate to each of the one or plurality of substrate supporters as a correction position, and   the controller controls the position adjustor such that the center of the substrate coincides with the correction position corresponding to the one substrate supporter before the transportation of the substrate to the one substrate supporter.   
     
     
         3 . The substrate processing apparatus according to  claim 2 , wherein
 each of the one or plurality of substrate supporters includes a first rotation holding device that holds the substrate in a horizontal attitude and rotates the substrate about a rotation axis,   the position adjustor has a reference axis and is configured to detect an amount of deviation between the center of the substrate that is carried in and the reference axis,   the controller controls the transport device such that the substrate is transported from the position adjustor to each substrate supporter, controls the first rotation holding device such that the transported substrate is rotated by a predetermined angle, controls the transport device such that the substrate is transported from the substrate supporter to the position adjustor, detects an amount of deviation detected by the position adjustor before the transportation from the position adjuster to each substrate supporter as a first amount of deviation, detects an amount of deviation detected by the position adjustor after the transportation from the substrate supporter to the position adjustor as a second amount of deviation and calculates the correction position based on the first and second amounts of deviation, during acquisition of the correction information, wherein   the storage stores the one or plurality of correction positions, corresponding to the one or plurality of substrate supporters, calculated by the controller as the one or plurality of correction information.   
     
     
         4 . The substrate processing apparatus according to  claim 3 , wherein
 the predetermined angle is 180 degrees.   
     
     
         5 . The substrate processing apparatus according to  claim 3 , wherein
 each of the one or plurality of substrate supporters is configured to perform the processing on the substrate rotated by the first rotation holding device during the processing for the substrate.   
     
     
         6 . The substrate processing apparatus according to  claim 2 , wherein
 each of the one or plurality of substrate supporters includes a guide mechanism that leads a position of the center of the substrate to the reference position,   the position adjustor has a reference axis and is configured to detect an amount of deviation between the center of the substrate that is carried in and the reference axis,   the position of the center of the substrate is led to the reference position by the guide mechanism in each of the one or plurality of substrate supporters during acquisition of the correction information,   the controller controls the transport device such that the substrate is transported from each of the one or plurality of substrate supporters to the position adjustor, acquires an amount of deviation detected by the position adjustor after transportation from the substrate supporter to the position adjustor and calculates the correction position based on the acquired amount of deviation, during acquisition of the correction information, and   the storage stores the one or plurality of correction positions, corresponding to the one or plurality of substrate supporters, calculated by the controller as the one or plurality of correction information.   
     
     
         7 . The substrate processing apparatus according to  claim 6 , wherein
 each of the one or plurality of substrate supporters is configured to perform temperature processing on the substrate during the processing for the substrate.   
     
     
         8 . The substrate processing apparatus according to  claim 2 , wherein
 the position adjustor includes   a substrate holder that holds the substrate,   a moving device that moves the substrate holder in a two-dimensional direction that is orthogonal to the reference axis, and   a position detector that detects a position of an outer periphery of the substrate held by the substrate holder, and   the controller calculates a position of the center of the substrate based on the position of the outer periphery of the substrate detected by the position detector, and controls the moving device based on the calculated position of the center of the substrate such that the center of the substrate held by the substrate holder coincides with the correction position corresponding to the one substrate supporter, before the transportation of the substrate to the one substrate supporter during the processing for the substrate.   
     
     
         9 . The substrate processing apparatus according to  claim 2 , wherein
 each of the one or plurality of substrate holders has a preset reference direction,   the position adjuster is configured to be capable of adjusting a direction of the substrate that is carried in, and   each of the one or plurality of correction information includes a direction to be adjusted by the position adjustor when the substrate is transported to each of the one or plurality of substrate supporters from the position adjuster in order for a direction of the transported substrate to coincide with the reference direction in the substrate supporter.   
     
     
         10 . The substrate processing apparatus according to  claim 9 , wherein
 each of the one or plurality of correction information includes a direction with which a direction of a notch of the substrate is to coincide in the position adjuster before the transportation of the substrate to each of the one or plurality of substrate supporters as a correction direction, and   the controller controls the position adjustor such that the direction of the notch of the substrate coincides with the correction direction corresponding to the one substrate supporter, before the transportation of the substrate to the one substrate supporter.   
     
     
         11 . The substrate processing apparatus according to  claim 10 , wherein
 the position adjuster includes   a second rotation holding device that holds the substrate in a horizontal attitude and rotates the substrate about a rotation axis,   a moving device that moves the second rotation holding device in a two-dimensional direction that is orthogonal to the reference axis, and   a position detector that detects a position of an outer periphery of the substrate rotated by the second rotation holding device, and   the controller calculates the position of the center of the substrate and the direction of the notch of the substrate based on the position of the outer periphery of the substrate detected by the position detector, controls the second rotation holding device and the moving device based on the calculated position of the center of the substrate and the calculated direction of the notch of the substrate such that the center of the substrate held by the second rotation holding device coincides with the correction position corresponding to the one substrate supporter, and controls the second rotation holding device and the moving device based on the calculated position of the center of the substrate and the calculated direction of the notch of the substrate such that the direction of the notch of the substrate held by the second rotation holding device coincides with the correction direction corresponding to the one substrate supporter, before the transportation of the substrate to the one substrate supporter during the processing for the substrate.   
     
     
         12 . A substrate processing method for performing processing on a substrate, including the steps of:
 storing one or plurality of correction information, corresponding to one or plurality of substrate supporters, acquired in advance for adjustment of a position of the substrate by a position adjustor;   adjusting the position of the substrate by the position adjustor based on the correction information, corresponding to one substrate supporter, of the one or plurality of correction information stored in the storage before the substrate is transported from the position adjustor to one substrate supporter of the one or plurality of substrate supporters during the processing for the substrate; and   transporting the substrate of which the position is adjusted by the position adjustor to the one substrate supporter by a transport device, wherein   each of the one or plurality of correction information indicates the position to be adjusted by the position adjustor when the substrate is transported to each of the one or plurality of substrate supporters from the position adjustor by the transport device in order for a center of the transported substrate to coincide with a reference position in the substrate supporter.