Projection exposure apparatus for semiconductor lithography including an actuator system

Abstract

The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.

1 - 22 . (canceled) 
     
     
         23 . A projection exposure apparatus, comprising:
 an optical element;   a mount for the optical element;   an actuator system to mechanically actuate the optical element, the actuator system comprising a heat transport element in thermal contact with regions of the mount that are exposed to heat generated during use of the actuator to reduce heat input into the optical element from the actuator system during use of the actuator system; and   a first control/regulating unit to drive the heat transport element to reducing heat input into the optical element,   wherein the projection exposure apparatus is a semiconductor microlithography projection exposure apparatus.   
     
     
         24 . The projection exposure apparatus according to claim  1 , wherein the heat transport element has a thermal conductivity of at least 400 W/(m*K). 
     
     
         25 . The projection exposure apparatus according to claim  1 , wherein the heat transport element comprises a cooling body remote from the regions of the mount. 
     
     
         26 . The projection exposure apparatus according to claim  1 , wherein the heat transport element comprises a thermally conductive strip. 
     
     
         27 . The projection exposure apparatus according to claim  1 , wherein the actuator system comprises a damping system. 
     
     
         28 . The projection exposure apparatus according to claim  1 , wherein the actuator system comprises at least one element selected from the group consisting of a piezocrawler, a piezo actuator, a plunger-type coil and an eddy current brake. 
     
     
         29 . The projection exposure apparatus according to claim  5 , wherein the damping system comprises a counter-vibrating mass with a damper. 
     
     
         30 . The projection exposure apparatus according to claim  1 , further comprising a body having a high specific heat capacity, wherein the body is thermal contact with at least one of the regions of the mount. 
     
     
         31 . The projection exposure apparatus according to claim  1 , further comprising an acceleration sensor connected to the first control/regulating unit so that the heat transport element reduces heat input into the optical element based on parameters determined by the acceleration sensor. 
     
     
         32 . The projection exposure apparatus according to claim  1 , further comprising a second control/regulating unit connected to the first control/regulating unit so that the heat transport element is driven to reduce heat input into the optical element based on imminent system events. 
     
     
         33 . The projection exposure apparatus according to claim  1 , further comprising a second control/regulating unit, wherein the first control/regulating unit is a portion of the second control/regulating unit so that the heat transport element is driven to reduce heat input into the optical element based on imminent system events. 
     
     
         34 . The projection exposure apparatus according to claim  1 , wherein the actuator system comprises a damping system comprising a passive damping element and an active damping element. 
     
     
         35 . The projection exposure apparatus according to claim  1 , wherein the projection exposure apparatus comprises a projection objective having the housing. 
     
     
         36 . The projection exposure apparatus according to claim  13 , wherein the actuator system is arranged in the projection objective. 
     
     
         37 . The projection exposure apparatus according to claim  13 , further comprising an illumination system. 
     
     
         38 . The projection exposure apparatus according to claim  1 , further comprising a housing, wherein the heat transport element is partially disposed outside the housing. 
     
     
         39 . The projection exposure apparatus according to claim  1 , wherein the heat transport element comprises a body having conduits therein, and the conduits are configured to have a fluid flow therethrough to reduce heat input into the optical element from the actuator system during use of the actuator system. 
     
     
         40 . The projection exposure apparatus of claim  17 , wherein the conduits are configured to be disposed in fluid communication with a lens cooler disposed in the exterior of the housing. 
     
     
         41 . A method of using a semiconductor microlithography projection exposure apparatus comprising an illumination system and a projection objective, the method comprising:
 using the illumination system to illuminate at least a portion of a mask comprising structures; and   using the projection objective to image at least a portion of the illuminated structures of the mask onto a photosensitive material supported by a subsrate,   wherein the projection exposure apparatus comprises:
 an optical element; 
 a mount for the optical element; 
 an actuator system to mechanically actuate the optical element, the actuator system comprising a heat transport element in thermal contact with regions of the mount that are exposed to heat generated during use of the actuator to reduce heat input into the optical element from the actuator system during use of the actuator system; and 
 a first control/regulating unit to drive the heat transport element to reducing heat input into the optical element. 
   
     
     
         42 . A projection objective, comprising:
 an optical element;   a mount for the optical element;   an actuator system to mechanically actuate the optical element, the actuator system comprising a heat transport element in thermal contact with regions of the mount that are exposed to heat generated during use of the actuator to reduce heat input into the optical element from the actuator system during use of the actuator system; and   a first control/regulating unit to drive the heat transport element to reducing heat input into the optical element,   wherein the projection objective is a semiconductor microlithography projection objective.