US2015279941A1PendingUtilityA1

Composite Wafer Having a Graphite Core

Assignee: INFINEON TECHNOLOGIES AGPriority: Sep 30, 2010Filed: May 22, 2015Published: Oct 1, 2015
Est. expirySep 30, 2030(~4.2 yrs left)· nominal 20-yr term from priority
H10P 14/3461H10P 14/3406H10P 14/2925H10P 14/2901H10P 14/265H10P 90/1906H10P 90/00H10W 10/181H10P 90/1904H10P 90/1914H10D 62/8325H10D 62/832H10D 62/83H10D 62/40H10D 62/00H01L 29/04H01L 29/161
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Claims

Abstract

A composite wafer including a carrier substrate having a graphite core and a monocrystalline semiconductor substrate or layer attached to the carrier substrate and a corresponding method for manufacturing such a composite wafer is provided.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A composite wafer, comprising:
 a carrier substrate comprising a graphite core; and   a monocrystalline semiconductor substrate selected from silicon carbide and silicon attached to the carrier substrate.   
     
     
         2 . The composite wafer of  claim 1 , wherein the carrier substrate comprises turbostratic or amorphous graphite. 
     
     
         3 . The composite wafer of  claim 1 , wherein the carrier substrate comprises a semiconductor rim structure laterally surrounding the graphite core. 
     
     
         4 . The composite wafer of  claim 1 , wherein the carrier substrate comprises a semiconductor wafer having a recess, wherein the graphite core is disposed in the recess. 
     
     
         5 . A composite wafer, comprising:
 a carrier substrate comprising a graphite core and a protective structure encapsulating the graphite core; and   a monocrystalline semiconductor layer attached to the carrier substrate.   
     
     
         6 . The composite wafer of  claim 5 , wherein the graphite core comprises turbostratic or amorphous graphite.

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