US2015251293A1PendingUtilityA1

Polishing method and method for producing alloy material

Assignee: FUJIMI INCPriority: Oct 3, 2012Filed: Oct 1, 2013Published: Sep 10, 2015
Est. expiryOct 3, 2032(~6.2 yrs left)· nominal 20-yr term from priority
B24B 37/015
41
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Claims

Abstract

The polishing method polishes an alloy material using a polishing pad and a polishing composition supplied to the polishing pad. The polishing composition contains an abrasive of silica or alumina, and a surface temperature of the polishing pad at the end of polishing is 20° C. or below. The method for producing an alloy material comprises a polishing step of polishing an alloy material using a polishing pad and a polishing composition supplied to the polishing pad. The polishing composition contains an abrasive of silica or alumina, and a surface temperature of the polishing pad at the end of polishing is 20° C. or below.

Claims

exact text as granted — not AI-modified
1 - 5 . (canceled) 
     
     
         6 . A method for polishing an alloy material, the method comprising:
 polishing the alloy material using a polishing pad and a polishing composition supplied to the polishing pad,   wherein the polishing composition contains an abrasive of silica or alumina, and   wherein a surface temperature of the polishing pad at the end of polishing is 20° C. or below.   
     
     
         7 . The method according to  claim 6 , wherein an object to be polished is a machined surface or a surface pre-polished after machining. 
     
     
         8 . The method according to  claim 6 , wherein the alloy material is mainly composed of any one of magnesium, aluminum, titanium, chromium and iron. 
     
     
         9 . The method according to  claim 6 , wherein the alloy material is mainly composed of aluminum and contains at least one metal element selected from silicon, magnesium, iron, copper and zinc in an amount of 0.5% by mass or more. 
     
     
         10 . A method for producing an alloy material comprising a polishing step of polishing an alloy material using a polishing pad and a polishing composition supplied to the polishing pad,
 wherein the polishing composition contains an abrasive of silica or alumina, and   wherein a surface temperature of the polishing pad at the end of polishing is 20° C. or below.

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