US2015243625A1PendingUtilityA1

Joining a chip to a substrate with solder alloys having different reflow temperatures

Assignee: IBMPriority: Aug 29, 2013Filed: May 11, 2015Published: Aug 27, 2015
Est. expiryAug 29, 2033(~7.1 yrs left)· nominal 20-yr term from priority
Inventors:Sylvain Pharand
H10W 90/724H10W 72/9415H10W 72/07255H10W 72/07254H10W 72/07236H10W 72/01257H10W 72/01225H10W 72/01223H10W 72/267H10W 72/257H10W 72/252H10W 72/242H10W 72/241H10W 72/221H10W 72/072H10W 72/29H10W 72/012H10W 72/20H01L 24/11H01L 2924/01029H01L 2924/01047H01L 2924/014H01L 2224/16113H01L 2924/0105H01L 2224/13139H01L 2224/16227H01L 24/17H01L 2224/17505
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Claims

Abstract

A method including forming a first solder bump on a chip, the first solder bump made of a first alloy, and forming a second solder bump on a chip, the second solder bump made of a second alloy, where the first alloy has a different alloy concentration and is different from the second alloy.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A method comprising:
 forming a first solder bump on a chip, the first solder bump made of a first alloy; and   forming a second solder bump on a chip, the second solder bump made of a second alloy,   wherein the first alloy has a different alloy concentration and is different from the second alloy.   
     
     
         2 . The method of  claim 1 , wherein the first and second alloys comprise at least one common element. 
     
     
         3 . The method of  claim 1 , wherein the first solder bump will be used to subsequently form a solder first connection for high current density power transfer, and wherein the second solder bump will be used to subsequently form a second solder connection for low current density signal transfer. 
     
     
         4 . The method of  claim 1 , wherein the first and second alloys comprise copper, silver, tin, or some combination thereof. 
     
     
         5 . The method of  claim 1 , wherein the first and second alloys are lead-free. 
     
     
         6 . The method of  claim 1 , wherein the first and second alloys comprises silver, the first alloy having a different silver concentration than the second alloy. 
     
     
         7 . The method of  claim 1 , wherein the first and second alloys comprise silver, and the first solder alloy having a higher silver content than the second solder alloy. 
     
     
         8 . The method of  claim 1 , wherein the first and second alloys both comprise a first element and a second element, the first element having a higher concentration than the second element, and the first solder alloy having a higher concentration of the first element than the second solder alloy. 
     
     
         9 . A structure comprising:
 a first solder connection between a substrate and a chip, the first solder connection made of a first alloy;   a second solder connection between the substrate and the chip, the second solder connection made of a second alloy,   wherein the first alloy has a different alloy concentration than the second alloy.   
     
     
         10 . The structure of  claim 9 , wherein the first solder connection is intended for high current density, and the second solder connection is intended for low current density. 
     
     
         11 . The structure of  claim 9 , wherein the first alloy has better electromigration resistance than the second alloy. 
     
     
         12 . The structure of  claim 9 , wherein the first alloy forms a stiffer solder connection than the second alloy.

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