US2015224622A1PendingUtilityA1

Polish cloth and method of manufacturing polish cloth

Assignee: TOSHIBA KKPriority: Feb 13, 2014Filed: Jul 25, 2014Published: Aug 13, 2015
Est. expiryFeb 13, 2034(~7.6 yrs left)· nominal 20-yr term from priority
Inventors:Tohru Kawaguchi
B24B 37/26B24B 37/22B24B 37/24
47
PatentIndex Score
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Claims

Abstract

A polish cloth including a polish layer having a polish surface configured to contact a polish object; a recess formed into the polish surface; and a coating applied at least along a bottom surface of the recess, the coating being made of a water repellant and oil repellant material.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A polish cloth comprising:
 a polish layer having a polish surface configured to contact a polish object;   a recess formed into the polish surface; and   a coating applied at least along a bottom surface of the recess, the coating being made of a water repellant and oil repellant material.   
     
     
         2 . The polish cloth according to  claim 1 , wherein the coating is further applied along a side surface of the recess. 
     
     
         3 . The polish cloth according to  claim 1 , wherein the polish surface further includes an uncoated region, the uncoated region occupying a region exclusive of the recess. 
     
     
         4 . The polish cloth according to  claim 1 , wherein a fluid contact angle in the recess ranges from 100 to 180 degrees. 
     
     
         5 . The polish cloth according to  claim 2 , wherein a fluid contact angle in the recess ranges from 100 to 180 degrees. 
     
     
         6 . The polish cloth according to  claim 3 , wherein a fluid contact angle in the recess ranges from 100 to 180 degrees. 
     
     
         7 . The polish cloth according to  claim 1 , wherein the polish layer further includes a foam hole. 
     
     
         8 . The polish cloth according to  claim 2 , wherein the polish layer further includes a foam hole. 
     
     
         9 . The polish cloth according to  claim 3 , wherein the polish layer further includes a foam hole. 
     
     
         10 . The polish cloth according to  claim 4 , wherein the polish layer further includes a foam hole. 
     
     
         11 . A method of manufacturing a polish cloth, the method comprising:
 forming a polish layer having a polish surface configured to contact a polish object;   forming a recess into the polish surface;   applying a coating entirely above the polish surface including the recess, the coating being formed of a water repellant and oil repellant material; and   removing the coating located in regions of the polish surface exclusive of the recess so that the coating remains at least along a bottom surface of the recess.   
     
     
         12 . The method according to  claim 11 , wherein the removing leaves the coating along a side surface of the recess. 
     
     
         13 . The method according to  claim 11 , wherein the removing forms an uncoated region in the polish surface, the uncoated region occupying a region exclusive of the recess. 
     
     
         14 . The method according to  claim 11 , wherein the applying increases a fluid contact angle in the recess so as to range from 100 degrees to 180 degrees. 
     
     
         15 . The method according to  claim 12 , wherein the removing increases a fluid contact angle in the recess so as to range from 100 degrees to 180 degrees. 
     
     
         16 . The method according to  claim 13 , wherein the removing increases a fluid contact angle in the recess so as to range from 100 degrees to 180 degrees. 
     
     
         17 . The method according to  claim 11 , wherein forming the polish layer forms a foam hole in the polish layer. 
     
     
         18 . The method according to  claim 12 , wherein forming the polish layer forms a foam hole in the polish layer. 
     
     
         19 . The method according to  claim 13 , wherein forming the polish layer forms a foam hole in the polish layer. 
     
     
         20 . The method according to  claim 14 , wherein forming the polish layer forms a foam hole in the polish layer.

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