US2015224622A1PendingUtilityA1
Polish cloth and method of manufacturing polish cloth
Est. expiryFeb 13, 2034(~7.6 yrs left)· nominal 20-yr term from priority
Inventors:Tohru Kawaguchi
B24B 37/26B24B 37/22B24B 37/24
47
PatentIndex Score
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Cited by
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Claims
Abstract
A polish cloth including a polish layer having a polish surface configured to contact a polish object; a recess formed into the polish surface; and a coating applied at least along a bottom surface of the recess, the coating being made of a water repellant and oil repellant material.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A polish cloth comprising:
a polish layer having a polish surface configured to contact a polish object; a recess formed into the polish surface; and a coating applied at least along a bottom surface of the recess, the coating being made of a water repellant and oil repellant material.
2 . The polish cloth according to claim 1 , wherein the coating is further applied along a side surface of the recess.
3 . The polish cloth according to claim 1 , wherein the polish surface further includes an uncoated region, the uncoated region occupying a region exclusive of the recess.
4 . The polish cloth according to claim 1 , wherein a fluid contact angle in the recess ranges from 100 to 180 degrees.
5 . The polish cloth according to claim 2 , wherein a fluid contact angle in the recess ranges from 100 to 180 degrees.
6 . The polish cloth according to claim 3 , wherein a fluid contact angle in the recess ranges from 100 to 180 degrees.
7 . The polish cloth according to claim 1 , wherein the polish layer further includes a foam hole.
8 . The polish cloth according to claim 2 , wherein the polish layer further includes a foam hole.
9 . The polish cloth according to claim 3 , wherein the polish layer further includes a foam hole.
10 . The polish cloth according to claim 4 , wherein the polish layer further includes a foam hole.
11 . A method of manufacturing a polish cloth, the method comprising:
forming a polish layer having a polish surface configured to contact a polish object; forming a recess into the polish surface; applying a coating entirely above the polish surface including the recess, the coating being formed of a water repellant and oil repellant material; and removing the coating located in regions of the polish surface exclusive of the recess so that the coating remains at least along a bottom surface of the recess.
12 . The method according to claim 11 , wherein the removing leaves the coating along a side surface of the recess.
13 . The method according to claim 11 , wherein the removing forms an uncoated region in the polish surface, the uncoated region occupying a region exclusive of the recess.
14 . The method according to claim 11 , wherein the applying increases a fluid contact angle in the recess so as to range from 100 degrees to 180 degrees.
15 . The method according to claim 12 , wherein the removing increases a fluid contact angle in the recess so as to range from 100 degrees to 180 degrees.
16 . The method according to claim 13 , wherein the removing increases a fluid contact angle in the recess so as to range from 100 degrees to 180 degrees.
17 . The method according to claim 11 , wherein forming the polish layer forms a foam hole in the polish layer.
18 . The method according to claim 12 , wherein forming the polish layer forms a foam hole in the polish layer.
19 . The method according to claim 13 , wherein forming the polish layer forms a foam hole in the polish layer.
20 . The method according to claim 14 , wherein forming the polish layer forms a foam hole in the polish layer.Join the waitlist — get patent alerts
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