Inertial sensor and method of manufacturing the same

Abstract

Disclosed herein are an inertial sensor and a method of manufacturing the same. The inertial sensor 100 according to a preferred embodiment of the present invention is configured to include a plate-shaped membrane 110, a mass body 120 disposed under a central portion 113 of the membrane 110, a post 130 disposed under an edge 115 of the membrane 110 so as to support the membrane 110, and a bottom cap 150 of which the edge 153 is provided with the first cavity 155 into which an adhesive 140 is introduced, wherein the adhesive 140 bonds an edge 153 to a bottom surface of the post, whereby the edge 153 of the bottom cap 150 is provided with the first cavity 155 to introduce the adhesive 140 into the first cavity 155, thereby preventing the adhesive 140 from being permeated into the post 130.

1 - 7 . (canceled) 
     
     
         8 . A method of manufacturing an inertial sensor, comprising:
 (A) preparing a bottom cap;   (B) forming a first cavity at an edge of the bottom cap;   (C) preparing a plate-shaped membrane, a mass body disposed under a central portion of the membrane, and a post disposed under the edge of the membrane so as to support the membrane; and   (D) bonding the edge of the bottom cap to the bottom surface of the post with an adhesive so as to cover the mass body and the post and introducing the adhesive into the first cavity.   
     
     
         9 . The method as set forth in  claim 8 , further comprising after step (A), forming a spacer having a predetermined thickness on the top surface of the bottom cap,
 wherein at step (D), the gap between the bottom surface of the post and the top surface of the bottom cap is equal to the predetermined thickness.   
     
     
         10 . The method as set forth in  claim 9 , wherein at the forming of the spacer, the spacer is disposed along the outermost side or the innermost side between the post and the bottom cap. 
     
     
         11 . The method as set forth in  claim 9 , further comprising after step (D), removing a portion corresponding to the top portion of the spacer in the membrane and the post, a portion corresponding to the bottom portion of the spacer in the bottom cap, and the spacer. 
     
     
         12 . The method as set forth in  claim 9 , wherein the forming of the spacer includes:
 forming an oxide layer, a plating layer, or a photoresist layer on the bottom cap; and   forming the spacer by selectively patterning the oxide layer, the plating layer, or the photoresist layer.   
     
     
         13 . The method as set forth in  claim 8 , wherein at step (B), the first cavity is formed by selectively etching the bottom cap. 
     
     
         14 . The method as set forth in  claim 8 , wherein at step (B), at least the two first cavities are formed. 
     
     
         15 . The method as set forth in  claim 8 , further comprising after step (A), forming a concave portion depressed in a thickness direction at the central portion of the bottom cap,
 wherein at step (D), the concave portion is spaced apart from the mass body.   
     
     
         16 . The method as set forth in  claim 15 , wherein at the forming of the concave portion, the concave portion is formed by selectively etching the bottom cap. 
     
     
         17 . The method as set forth in  claim 15 , further comprising at the forming of the concave portion, forming a stopper protruded in a direction of the mass body on the concave portion. 
     
     
         18 . The method as set forth in  claim 17 , further comprising simultaneously forming the first cavity, the concave portion, and the stopper by selectively etching the bottom cap. 
     
     
         19 - 22 . (canceled)