US2015210548A1PendingUtilityA1

In-line manufacture of carbon nanotubes

Assignee: FASTCAP SYSTEMS CORPPriority: Aug 19, 2011Filed: Apr 10, 2015Published: Jul 30, 2015
Est. expiryAug 19, 2031(~5.1 yrs left)· nominal 20-yr term from priority
G06F 3/033G06F 2203/04807B82Y 40/00G06F 3/016C01B 32/16G06F 3/04842B01J 2219/0894B01J 2219/0892B82Y 30/00Y10S977/843B01J 19/22Y10S977/742G06F 3/04883G06F 3/03545G06F 3/0481C01B 2202/08B01J 2219/0879B05D 1/04B01J 2208/00548C23C 16/0272H01J 2237/3327C23C 14/34C23C 16/26C23C 16/52B01J 8/0015B01J 2208/024B01J 8/02C23C 14/24C23C 14/0605B01J 2208/00017C23C 14/54B01J 2208/00539C23C 14/325C23C 14/221C23C 14/024C01B 31/0226B01J 2208/00752H01J 37/34
46
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

Mass production of carbon nanotubes (CNT) are facilitated by methods and apparatus disclosed herein. Advantageously, the methods and apparatus make use of a single production unit, and therefore provide for uninterrupted progress in a fabrication process. Embodiments of control systems for a variety of CNT production apparatus are included.

Claims

exact text as granted — not AI-modified
1 . A method of producing an aggregate of vertically aligned carbon nanotubes, the method comprising:
 (a) loading a base material into a controlled environment;   (b) disposing a catalyst onto the base material to provide a substrate in an environment having an oxygen concentration low enough to substantially prevent oxidation of the substrate;   (c) subjecting the substrate to a carbonaceous raw material gas and heating at least one of the raw material gas and the substrate for growing the aggregate onto the substrate; and   (d) cooling the aggregate in an environment having an oxygen concentration low enough to substantially prevent oxidation of the aggregate during the cooling;   wherein steps (a) to (d) are performed in the controlled environment comprising chambers sequentially connected in a manner that limits the exposure of the base material and any catalyst, substrate, and aggregate disposed thereon to contamination between each step.   
     
     
         2 . The method of  claim 1 , further comprising disposing a carburizing prevention layer on at least one of the base material and the catalyst. 
     
     
         3 . The method of  claim 1 , wherein disposing the catalyst comprises using at least one of sputtering evaporation, cathodic arc deposition, sputter deposition, ion beam assisted deposition, ion beam induced deposition and electrospray ionization. 
     
     
         4 . The method of  claim 1 , further comprising treating the substrate with a plasma. 
     
     
         5 . The method of  claim 1 , further comprising subjecting the substrate to a catalyst activation material during the growing of the aggregate. 
     
     
         6 . The method of  claim 5 , further comprising adding the catalyst activation material to the raw material gas. 
     
     
         7 . The method of  claim 1 , further comprising selecting a production apparatus comprising components treated to limit buildup of contaminants. 
     
     
         8 . The method of  claim 7 , wherein treatment of the components comprises passivating the components with at least one passivation material. 
     
     
         9 . The method of  claim 8 , wherein the passivation material comprises a silicon containing material. 
     
     
         10 . An apparatus for fabricating an aggregate of vertically aligned carbon nanotubes, the apparatus comprising:
 a first section adapted for receiving a substrate and disposing a catalyst thereon; a second section adapted for growing the aggregate onto the substrate;   at least one of the first section and the second section comprising at least component that has been passivated to substantially limit deposition of carbon thereon.   
     
     
         11 . The apparatus of  claim 10 , wherein the at least one component has been passivated with at least one form of silicon. 
     
     
         12 . The apparatus of  claim 10 , wherein passivation has been completed by at least one cycle of deposition of a silicon containing compound onto the at least one component and heating the at least one component. 
     
     
         13 . The apparatus of  claim 10 , wherein at least one of the first section and the second section are fabricated from components substantially capable of resisting high temperatures. 
     
     
         14 . The apparatus of  claim 10 , further comprising a control system for controlling the fabricating. 
     
     
         15 . The apparatus of  claim 10 , further comprising components for disposing the catalyst by at least one of sputtering, chemical vapor deposition (CVD), thermal deposition and ion-beam deposition. 
     
     
         16 . An apparatus for fabricating an aggregate of vertically aligned carbon nanotubes, the apparatus comprising:
 a first section adapted for receiving a substrate and disposing a catalyst thereon; a second section adapted for growing the aggregate onto the substrate; and   a control system for controlling the fabricating.   
     
     
         17 . The apparatus of  claim 16 , further comprising at least one sensor adapted for monitoring the fabricating and providing monitoring information. 
     
     
         18 . The apparatus of  claim 16 , wherein the control system comprises a set of computer executable instructions stored on machine readable media, the instructions comprising instructions for controlling at least one aspect of the fabricating. 
     
     
         19 . The apparatus of  claim 18 , wherein the aspect comprises at least one of: disposing of the catalyst; a temperature; a pressure; a feed rate; a setting for at least one of a valve, a heater, a gas supply, a motor and a servo; an order of steps in the fabricating; an optical system and rejection of defective materials. 
     
     
         20 . The method of  claim 1 , wherein, during the performance of steps (a) to (d), the chambers are sequentially connected in a manner that substantially prevents the exposure of the base material and any catalyst, substrate, and aggregate disposed thereon to room air between each step.

Join the waitlist — get patent alerts

Track US2015210548A1 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.