Liquid crystal integrated circuit and method to fabricate same

Abstract

A structure includes a first substrate having a first surface and a second substrate having a second surface facing the first surface; liquid crystal material disposed between the first and second surfaces; a first upstanding electrode disposed over the first surface and extending into the liquid crystal material towards the second surface; and a first planar electrode disposed upon the first surface and electrically connected with the first upstanding electrode. The first planar electrode at least partially surrounds the first upstanding electrode. A combination of the first upstanding electrode and the first planar electrode forms at least a portion of a pixel of a liquid crystal display. Various methods to fabricate the structure are also disclosed.

1 - 15 . (canceled) 
     
     
         16 . A method to fabricate electrodes for a liquid crystal display, comprising:
 providing a substrate having a surface;   coating the surface with a dielectric material;   patterning the dielectric material to form a plurality of upstanding first electrode structures each having a height that exceeds a width;   coating the upstanding first electrode structures and the substrate surface between upstanding first electrode structures with an electrically conductive material; and   removing the electrically conductive material from between two adjacent upstanding first electrode structures so as to retain a portion of the electrically conductive material upon the substrate surface thereby forming substantially planar second electrode structures individual ones of which are electrically continuous with the electrically conductive material that coats an associated upstanding first electrode structure.   
     
     
         17 . The method as in  claim 16 , where the dielectric material is comprised of a photo-patternable low dielectric constant material, and where the electrically conductive material is comprised of indium-tin-oxide. 
     
     
         18 . The method as in  claim 16 , where at least one sidewall of each upstanding first electrode structure is disposed at other than 90° to the substrate surface. 
     
     
         19 . A method to fabricate electrodes for a liquid crystal display, comprising:
 providing a substrate having a surface;   depositing a first layer comprised of an electrically conductive material on the surface;   depositing a second layer comprised of photoresist on the first layer;   selectively removing first portions of the second layer to leave second portions, each second portion being located at a position where an electrode is to be formed; and   removing those portions of the first layer underlying the second portions of the second layer, and removing the second portions of the second layer, leaving on the surface upstanding first electrode structures each having a height that exceeds a width.   
     
     
         20 . The method as in  claim 19 , further comprising an initial step of forming planar electrodes on the surface located at the positions where an electrode is to be formed such that each upstanding first electrode structure is electrically continuous with one of the planar electrodes. 
     
     
         21 . The method as in  claim 19 , where the electrically conductive material is comprised of indium-tin-oxide. 
     
     
         22 . A method to fabricate electrodes for a liquid crystal display, comprising:
 providing a substrate having a surface;   depositing a layer comprised of photoresist on the substrate surface;   opening apertures through the layer to expose the substrate surface at locations corresponding to positions where an electrode is to be formed;   filling the apertures with an electrically conductive material; and   removing the layer of photoresist leaving on the surface upstanding first electrode structures comprised of the electrically conductive material, each upstanding first electrode structure having a height that exceeds a width.   
     
     
         23 . The method as in  claim 22 , further comprising an initial step of forming planar electrodes on the surface located at the positions where an electrode is to be formed such that each upstanding first electrode structure is electrically continuous with one of the planar electrodes. 
     
     
         24 . The method as in  claim 22 , where the electrically conductive material is comprised of indium-tin-oxide that is subjected to a thermal process.