Mold, optical element and method for manufacturing the same
Abstract
A method for manufacturing a mold or an optical element provided with a fine surface roughness according to an embodiment of the present invention is a method in which the fine surface roughness has been manufactured using a reactive etching apparatus. In the apparatus a substrate or a film made of a semiconductor or a metal which reacts with sulfur hexafluoride is placed, and into which a mixed gas of sulfur hexafluoride and oxygen is introduced and tuned into plasma such that oxides are made to be scattered on a surface of the substrate or the film, the surface of the substrate or the film is made to undergo etching by the sulfur hexafluoride while the oxides function as an etching mask, and thus the fine surface roughness is formed on the surface of the substrate or the film.
Claims
exact text as granted — not AI-modified1 . A method for manufacturing a mold or an optical element provided with a fine surface roughness, wherein the fine surface roughness has been manufactured using a reactive etching apparatus, in which a substrate or a film made of a semiconductor or a metal which reacts with sulfur hexafluoride is placed, and into which a mixed gas of sulfur hexafluoride and oxygen is introduced and tuned into plasma such that oxides are made to be scattered on a surface of the substrate or the film, the surface of the substrate or the film is made to undergo etching by the sulfur hexafluoride while the oxides function as an etching mask, and thus the fine surface roughness is formed on the surface of the substrate or the film.
2 . A mold manufactured by the method according to claim 1 .
3 . A mold according to claim 2 , wherein the fine surface roughness on the mold is used to form an anti-reflective structure.
4 . A mold according to claim 2 , wherein the fine surface roughness on the mold is used to form a diffusing structure.
5 . An optical element manufactured by the method according to claim 1 .Join the waitlist — get patent alerts
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