System for cleaning photomasks

Abstract

A system for cleaning a photomask with a target surface includes a retaining device for retaining the photomask, a cleansing device, an elevating platform and a drying device. The cleansing device has a fluid dispensing unit and a scrubbing unit. The scrubbing unit having a saturated scrubbing surface is used to clean photomasks with the obliquely dispensed fluids. In such a fashion, loosened contaminants are removed. At least one oblique surface is formed on the peripheries of the scrubbing surface to form a channeling region such that fluids can instantly flow away from photomasks after cleaning to prevent re-contamination.

What is claimed is: 
     
         1 . A photomask cleaning system for cleaning a photomask having a target surface, comprising:
 a retaining device retaining the photomask;   a cleansing device arranged towards the target surface, including:
 a fluid dispensing unit having at least one direct dispenser and at least one oblique dispenser arranged on a side thereof configured to obliquely dispense fluid towards the target surface, 
 a scrubbing unit disposed on the direct dispenser for cleaning the target surface, 
 a cover disposed on the peripheries of the direct dispenser for securing the scrubbing unit thereon, 
 a fixing unit securing the cover on the fluid dispensing unit, and 
 a stage including a retaining plate correspondingly arranged with the fluid dispensing unit and at least one fluid supplying conduit connected to the retaining plate on one side thereof for supplying fluids to the oblique dispenser and the direct dispenser; 
   an elevating platform arranged on a side of the cleansing device for adjusting a corresponding position of the cleansing device with respect to the photomask; and   a drying device arranged towards the target surface and proximate to the cleansing device.   
     
     
         2 . The system as recited in  claim 1 , wherein a pair of oblique dispensers is disposed on two sides of the fluid dispensing unit and the direct dispenser is disposed between the pair of oblique dispensers. 
     
     
         3 . The system as recited in  claim 1 , wherein the direct dispenser is disposed closer to the photomask compared to the oblique dispensers. 
     
     
         4 . The system as recited in  claim 1 , wherein the fluid dispensing unit further includes a ridge arranged on two sides of the direct dispenser and correspondingly conforms to a groove arranged on the cover. 
     
     
         5 . The system as recited in  claim 4 , wherein the scrubbing unit is partially bent such that the ridge retains the scrubbing unit inside the groove. 
     
     
         6 . The system as recited in  claim 1 , wherein the cover is integrally formed with an oblique surface correspondingly arranged with the photomask and slanted towards the retaining plate. 
     
     
         7 . The system as recited in  claim 1 , wherein the cleansing device further includes a guiding base having a plurality of guiding channels and disposed between the fluid dispensing unit and the retaining plate, the guiding channels are correspondingly arranged with the oblique dispensers and the direct dispenser. 
     
     
         8 . The system as recited in  claim 7 , wherein the guiding base includes an oblique surface slanted towards the retaining plate. 
     
     
         9 . The system as recited in  claim 1 , further includes a processing unit for adjusting the position of the elevating platform. 
     
     
         10 . The system as recited in  claim 9 , further includes a sensor element for determining the position of photomask and scrubbing unit and transferring the positioning data to the processing unit.