Run-off path to collect liquid for an immersion lithography apparatus

Abstract

An exposure apparatus exposes a substrate with light from an object through an optical assembly and liquid. The exposure apparatus includes a stage and a liquid supply system. The stage is movable relative to the optical assembly and holds the substrate so that the substrate faces the optical assembly across the liquid. The liquid supply system includes an outlet arranged so as to face a top surface of the substrate held by the stage and supplies the liquid from the outlet onto the top surface. The stage includes a support which supports an undersurface of the substrate, and a channel having a port. The port is arranged outside the support so as to recover the liquid supplied from the outlet and flowing outwardly from the top surface of the substrate supported by the support.

What is claimed is: 
     
         1 . An exposure apparatus which exposes a substrate with light from an object through an optical assembly and liquid, the exposure apparatus comprising:
 a stage which is movable relative to the optical assembly and which holds the substrate so that the substrate faces the optical assembly across the liquid; and   a liquid supply system which includes an outlet arranged so as to face a top surface of the substrate held by the stage and which supplies the liquid from the outlet onto the top surface, wherein   the stage comprises:   a support which supports an undersurface of the substrate; and   a channel having a port, the port is arranged outside the support so as to recover the liquid supplied from the outlet and flowing outwardly from the top surface of the substrate supported by the support.   
     
     
         2 . The exposure apparatus according to  claim 1 , further comprising a liquid recovery system which includes an inlet arranged so as to face the top surface of the substrate held by the stage and which recovers the liquid on the top surface through the inlet. 
     
     
         3 . The exposure apparatus according to  claim 2 , wherein the outlet and the inlet are arranged radially outward of an optical element that is provided at an end part of the optical assembly. 
     
     
         4 . The exposure apparatus according to  claim 2 , wherein the liquid recovery system recovers more of the liquid supplied from the outlet than the channel on the stage. 
     
     
         5 . The exposure apparatus according to  claim 1 , wherein the port of the channel is arranged so that the port is located below the top surface of the substrate when the substrate is supported by the support. 
     
     
         6 . A device manufacturing method comprising:
 exposing a substrate with light from an object by use of the exposure apparatus according to  claim 1 ; and   developing the substrate exposed with the light.