US2015162523A1PendingUtilityA1
Piezoelectric device
Est. expiryDec 6, 2033(~7.3 yrs left)· nominal 20-yr term from priority
H01L 41/1138H01L 41/0478H10N 30/308H04R 17/02H10N 30/853H04R 17/025H04R 19/016H04R 2201/003H10N 30/878
50
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Claims
Abstract
A piezoelectric device that includes: a diaphragm; a supporting part configured to support at least a portion of an end of the diaphragm; a piezoelectric film disposed along a portion supported by the supporting part on the diaphragm, a width of the film along the supported portion being narrower than a width of the portion; a lower electrode disposed at a face of the piezoelectric film on a diaphragm side; and an upper electrode disposed on a face of the piezoelectric film on an opposite side to the diaphragm.
Claims
exact text as granted — not AI-modifiedI (we) claim:
1 . A piezoelectric device comprising:
a diaphragm having a first surface and a second surface; a supporting part adjacent the second surface of the diaphragm and configured to support at least a portion of an end of the diaphragm; a piezoelectric film adjacent the first surface of the diaphragm and disposed along the portion of the end of the diaphragm supported by the supporting part, a width of the piezoelectric film along the supported portion being narrower than a width of the supported portion; and an electrode disposed on a surface of the piezoelectric film opposite to the diaphragm.
2 . The piezoelectric device according to claim 1 , wherein the diaphragm is formed of a degenerate semiconductor.
3 . The piezoelectric device according to claim 2 , wherein the electrode is an upper electrode and the diaphragm is configured to function as a lower electrode for the piezoelectric film.
4 . The piezoelectric device according to claim 1 , wherein the electrode is an upper electrode and the piezoelectric device includes a lower electrode disposed on a surface of the diaphragm.
5 . The piezoelectric device according to claim 1 , wherein the diaphragm has a substantially rectangular shape.
6 . The piezoelectric device according to claim 5 , wherein the supporting part is configured to support a pair of opposing sides of the diaphragm.
7 . The piezoelectric device according to claim 6 , further comprising a plurality of piezoelectric films disposed along each side of the pair of sides of the diaphragm.
8 . The piezoelectric device according to claim 7 , wherein the diaphragm is divided along a first substantial center line substantially parallel to the pair of opposing sides.
9 . The piezoelectric device according to claim 8 , wherein the diaphragm is further divided along a second substantial center line substantially perpendicular to the pair of opposing sides.
10 . The piezoelectric device according to claim 5 , wherein the supporting part is configured to support all sides of the diaphragm, and
a plurality of piezoelectric films are disposed along each side of all the sides of the diaphragm.
11 . The piezoelectric device according to claim 1 , wherein
the diaphragm is thinner at a center region thereof than a region thereof where the piezoelectric film is disposed.
12 . The piezoelectric device according to claim 1 , wherein
the piezoelectric film has a compressive stress, and the upper electrode has a tensile stress.
13 . The piezoelectric device according to claim 1 , wherein the supporting part includes a supporting part and an insulating layer.
14 . The piezoelectric device according to claim 13 , wherein the insulating layer is adjacent the diaphragm.
15 . The piezoelectric device according to claim 14 , wherein the insulating layer is silicon oxide.
16 . The piezoelectric device according to claim 1 , further comprising a plurality of piezoelectric films adjacent the first surface of the diaphragm, the plurality of piezoelectric films being electrically coupled in parallel.
17 . The piezoelectric device according to claim 1 , wherein the diaphragm has a substantially circular shape.Join the waitlist — get patent alerts
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