Substrate processing apparatus

Abstract

A substrate processing apparatus comprising a processing vessel evacuated by an evacuation system and accommodating therein a stage configured to hold a substrate; a superheated steam generator configured to supply a superheated steam to said processing vessel; a gas supplying apparatus supplying an inert gas or a reducing gas to said processing vessel; an oxygen concentration level measuring device configured to measure an oxygen concentration level in said processing vessel; and a heating mechanism provided in said stage and configured to heat said substrate on said stage to a temperature of said superheated steam to which said substrate is exposed, wherein said superheated steam generator supplies said superheated steam to said processing vessel with a temperature higher than a temperature of said substrate on the stage.

What is claimed is: 
     
         1 . A substrate processing apparatus comprising:
 a processing vessel evacuated by an evacuation system and accommodating therein a stage configured to hold a substrate;   a superheated steam generator configured to supply a superheated steam to said processing vessel;   a gas supplying apparatus supplying an inert gas or a reducing gas to said processing vessel;   an oxygen concentration level measuring device configured to measure an oxygen concentration level in said processing vessel; and   a heating mechanism provided in said stage and configured to heat said substrate on said stage to a temperature of said superheated steam to which said substrate is exposed,   wherein said superheated steam generator supplies said superheated steam to said processing vessel with a temperature higher than a temperature of said substrate on the stage.