US2015104649A1PendingUtilityA1

Laminated Sheet and Method of Manufacturing Semiconductor Device Using the Laminated Sheet

Assignee: NITTO DENKO CORPPriority: Dec 12, 2011Filed: Dec 22, 2014Published: Apr 16, 2015
Est. expiryDec 12, 2031(~5.4 yrs left)· nominal 20-yr term from priority
H10W 74/00H10W 99/00H10P 72/7404H10W 72/0198H10W 74/15H10W 72/07338H10W 72/073H10W 72/07332H10W 72/072H10W 72/241H10W 72/07232H10W 72/354H10W 72/342H10W 72/01336H10W 90/724H10W 90/726H10W 72/252H10W 90/736H10W 90/734H10W 74/40H10P 72/7442H10P 72/7438H10P 72/7422H10P 72/7416H10P 72/744H10P 72/7402H10P 54/00C09J 2203/326C09J 7/0207C09J 2201/606C09J 7/20C09J 2301/312C09J 2301/304Y10T428/31511B32B 3/30C09J 2463/00Y10T428/24355C09J 2301/302C09J 2301/208C09J 7/38B23B 3/30
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Claims

Abstract

The present invention provides a laminated sheet that can prevent the decrease in adhering strength of a resin composition layer and the deterioration in electrical reliability and in which a back grinding tape can be peeled from a plurality of semiconductor elements collectively after dicing. The laminated sheet has a back grinding tape in which a pressure-sensitive adhesive layer is formed on a base, and a resin composition layer that is provided on the pressure-sensitive adhesive layer of the back grinding tape, wherein the tensile modulus of the pressure-sensitive adhesive layer at 23° C. is 0.1 to 5.0 MPa, and the T-peeling strength between the pressure-sensitive adhesive layer and the resin composition layer is 0.1 to 5 N/20 mm at 23° C. and 300 mm/min.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A laminated sheet having a back grinding tape in which a pressure-sensitive adhesive layer is formed on a base, and a resin composition layer that is provided on the pressure-sensitive adhesive layer of the back grinding tape, wherein
 a tensile modulus of the pressure-sensitive adhesive layer at 23° C. is 0.1 to 5.0 MPa, and   a T-peeling strength between the pressure-sensitive adhesive layer and the resin composition layer is 0.1 to 5 N/20 mm at 23° C. and 300 mm/min.   
     
     
         2 . The laminated sheet according to  claim 1 , wherein the resin composition layer contains a thermosetting resin. 
     
     
         3 . The laminated sheet according to  claim 1 , wherein the thermosetting resin is an epoxy resin.

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