Method and apparatus for warming up a vacuum pump arrangement
Abstract
A method for warming up a vacuum pump arrangement having a booster pump and a backing pump downstream of the booster pump for evacuating a process chamber includes setting the booster pump at a first speed higher than an idle speed of the booster pump when the same is in an idle mode; and controlling a backing pressure at an outlet of the booster pump within a range from 0.1 mbar to 10 mbar at least for a period of time from when the vacuum pump arrangement is activated from the idle mode to when the booster pump reaches a temperature equal to or exceeding a first predetermined threshold value. Such method is implemented in system where a controlled is configured to carry out the above-motioned actions.
Claims
exact text as granted — not AI-modified1 . A method for warming up a vacuum pump arrangement having a booster pump and a backing pump downstream of the booster pump for evacuating a process chamber, comprising:
setting the booster pump at a first speed higher than an idle speed of the booster pump when the booster pump is in an idle mode; and controlling a backing pressure at an outlet of the booster pump within a range from 0.1 millibar to 10 millibar at least for a period of time from when the vacuum pump arrangement is activated from the idle mode to when the booster pump reaches a temperature equal to or exceeding a first predetermined threshold temperature value.
2 . The method of claim 1 , wherein the controlling a backing pressure comprising adjusting a speed of the backing pump, wherein an inlet of the backing pump is connected to the outlet of the booster pump.
3 . The method of claim 2 , wherein the backing pump is set at a second speed when the vacuum pump arrangement is activated from the idle mode.
4 . The method of claim 3 , wherein the second speed of the backing pump is decreased to a predetermined level in order for the backing pressure of the booster pump to fall within the range from 0.1 millibar to 10 millibar.
5 . The method of claim 4 , wherein the second speed is decreased to the predetermined level incrementally over a number of time intervals.
6 . The method of claim 1 , wherein the controlling the backing pressure comprising injecting a purge gas at the outlet of the booster pump.
7 . The method of claim 6 , wherein a flow rate of the purge gas is controlled in a manner that the backing pressure of the booster pump is adjusted into the range from 0.1 millibar to 10 millibar.
8 . The method of claim 1 , wherein the vacuum pump arrangement is set to be ready for evacuating the process chamber in a normal operation mode when the temperature of the booster pump is equal to or exceeds the first predetermined threshold value and a temperature of the backing pump is equal to or exceeds a second predetermined threshold value.
9 . An apparatus comprising:
a process chamber; a booster pump having an inlet fluidly connected to an outlet of the process chamber; a backing pump having an inlet fluidly connected to an outlet of the booster pump for, together with the booster pump, evacuating the process chamber; and a controller electrically coupled with the booster pump and the backing pump, the controller being configured to control a backing pressure at the outlet of the booster pump within a range from 0.1 millibar to 10 millibar at least for a period of time from when the booster pump and the backing pump are activated from an idle mode to when the booster pump reaches a temperature equal to or exceeding a first predetermined threshold value.
10 . The apparatus of claim 9 , wherein the controller is configured to control the backing pressure of the booster by adjusting a speed of the backing pump.
11 . The apparatus of claim 10 , wherein the controller is configured to set the backing pump at a predetermined speed when the vacuum pump arrangement is activated from the idle mode.
12 . The apparatus of claim 11 , wherein the controller is configured to reduce the predetermined speed of the backing pump to a predetermined level in order for the backing pressure of the booster pump to fall within into the range from 0.1 millibar to 10 millibar.
13 . The apparatus of claim 12 , wherein the controller is configured to reduce the predetermined speed to the predetermined level incrementally over a number of time intervals.
14 . The apparatus of claim 9 , further comprising a source of purge gas fluidly connected at the outlet of the booster pump.
15 . The apparatus of claim 14 , wherein the controller is configured to control a flow rate of a purge gas being injected at the outlet of the booster pump, thereby controlling the backing pressure of the booster pump within the range from 0.1 millibar to 10 millibar.
16 . The apparatus of claim 9 , wherein the booster pump and the backing pump are set to be ready for evacuating the process chamber in a normal operation mode when the temperature of the booster pump is equal to or exceeds the first predetermined threshold value and a temperature of the backing pump is equal to or exceeds a second predetermined threshold value.Join the waitlist — get patent alerts
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