Rotatable substrate support having radio frequency applicator

Abstract

A substrate support assembly includes a shaft assembly, a pedestal coupled to a portion of the shaft assembly, and a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a first coil member surrounding a rotatable shaft member that is electrically coupled to the shaft assembly, the first coil member being rotatable with the rotatable shaft, and a second coil member surrounding the first coil member, the second coil member being stationary relative to the first coil member, wherein the first coil member electrically couples with the second coil member when the rotating radio frequency applicator is energized and provides a radio frequency signal/power to the pedestal through the shaft assembly.

1 . A substrate support assembly, comprising:
 a shaft assembly;   a pedestal coupled to a portion of the shaft assembly; and   a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a rotatable radio frequency applicator, the rotatable radio frequency applicator comprising:
 a first coil member surrounding a rotatable shaft that is electromagnetically coupled to the shaft assembly during operation, the first coil member being rotatable with the rotatable shaft during operation; and 
 a second coil member surrounding the first coil member, the second coil member being stationary relative to the first coil member, wherein the first coil member electromagnetically couples with the second coil member when the rotatable radio frequency applicator is energized and provides a radio frequency power to the pedestal through the shaft assembly. 
   
     
     
         2 . The substrate support assembly of  claim 1 , wherein, during operation, two separated RF return paths are formed to make a unified DC ground reference. 
     
     
         3 . The substrate support assembly of  claim 1 , wherein the first coil member inductively couples with the second coil member when the rotating radio frequency applicator is energized. 
     
     
         4 . The substrate support assembly of  claim 1 , wherein the rotatable shaft member comprises a dielectric material. 
     
     
         5 . The substrate support assembly of  claim 4 , wherein the rotatable shaft comprises a ferrite structure. 
     
     
         6 . The substrate support assembly of  claim 1 , further comprising:
 a second rotary connector for providing a coolant to the pedestal.   
     
     
         7 . The substrate support assembly of  claim 6 , further comprising:
 a third rotary connector for transmitting electrical signals/power to and from the pedestal.   
     
     
         8 . The substrate support assembly of  claim 7 , further comprising:
 a fourth rotary connector for providing a gas to the pedestal.   
     
     
         9 . The substrate support assembly of  claim 1 , wherein the shaft assembly further comprises:
 a conductive central shaft electromagnetically coupled to the first coil member.   
     
     
         10 . The substrate support assembly of  claim 9 , wherein the conductive central shaft includes a circular conductive plate disposed at an end of the conductive central shaft disposed in the pedestal. 
     
     
         11 . The substrate support assembly of  claim 9 , further comprising a conductive housing disposed about the rotatable radio frequency applicator. 
     
     
         12 . The substrate support assembly of  claim 11 , wherein the conductive housing comprises a slit containing a dielectric material. 
     
     
         13 . The substrate support assembly of  claim 12 , wherein the slit is formed through the conductive housing. 
     
     
         14 . A substrate support assembly, comprising:
 a shaft assembly;   a pedestal coupled to a portion of the shaft assembly; and   a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises:
 a rotatable coil member surrounding a rotatable dielectric shaft that is electromagnetically coupled to the shaft assembly during operation; 
 a stationary coil member surrounding the rotatable coil member, wherein the rotatable coil member electromagnetically couples with the stationary coil member when the rotatable radio frequency applicator is energized and provides a radio frequency power to the pedestal through the shaft assembly; and 
 a conductive housing disposed about the stationary coil member. 
   
     
     
         15 . The substrate support assembly of  claim 14 , wherein the conductive housing comprises a circular housing surrounding the stationary coil member and one or more conductive plates surrounding the rotatable dielectric shaft. 
     
     
         16 . The substrate support assembly of  claim 14 , wherein, during operation, two separated RF return paths are formed to make a unified DC ground reference. 
     
     
         17 . A substrate support assembly, comprising:
 a shaft assembly;   a pedestal coupled to a portion of the shaft assembly; and   a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a rotatable radio frequency applicator, the rotatable radio frequency applicator comprising:
 a rotating conductive member surrounding a rotatable shaft member that is electromagnetically coupled to the shaft assembly during operation; 
 a stationary conductive member at least partially surrounding the rotating conductive member, wherein the rotating conductive member electromagnetically couples with the stationary conductive member when the rotatable radio frequency applicator is energized and provides a radio frequency power to the pedestal through the shaft assembly; and 
 a conductive housing surrounding the rotatable radio frequency applicator. 
   
     
     
         18 . The substrate support assembly of  claim 17 , wherein, during operation, two separated RF return paths are formed to make a unified DC ground reference. 
     
     
         19 . The substrate support assembly of  claim 17 , wherein the rotatable shaft member comprises a dielectric material. 
     
     
         20 . The substrate support assembly of  claim 19 , wherein the rotatable shaft member comprises a ferrite structure.