High-load durable anode for oxygen generation and manufacturing method for the same

Abstract

The present invention aims to provide a high-load durable anode for oxygen generation and a manufacturing method for the same used for industrial electrolyses including manufacturing of electrolytic metal foils such as electrolytic copper foil, aluminum liquid contact and continuously electrogalvanized steel plate, and metal extraction, having superior durability under high-load electrolysis conditions. The present invention features an anode for oxygen generation and a manufacturing method for the same comprising a conductive metal substrate and a catalyst layer containing iridium oxide formed on the conductive metal substrate wherein the amount of coating of iridium per time for the catalyst layer is 2 g/m 2 or more, the coating is baked in a relatively high temperature region of 430 degrees Celsius-480 degrees Celsius to form the catalyst layer containing amorphous iridium oxide and the catalyst layer containing the amorphous iridium oxide is post-baked in a further high temperature region of 520 degrees Celsius-600 degrees Celsius to crystallize almost all amount of iridium oxide in the catalyst layer.

1 . An anode for oxygen generation comprising a conductive metal substrate and a catalyst layer containing iridium oxide formed on the conductive metal substrate, wherein the amount of coating of iridium per time for the catalyst layer is 2 g/m 2  or more, the coating is baked in a high temperature region of 430 degrees Celsius-480 degrees Celsius to form the catalyst layer containing amorphous iridium oxide and the catalyst layer containing the amorphous iridium oxide is post-baked in a high temperature region of 520 degrees Celsius-600 degrees Celsius to crystallize almost all amount of iridium oxide in the catalyst layer. 
     
     
         2 . The anode for oxygen generation as in  claim 1 , comprising the conductive metal substrate and the catalyst layer containing iridium oxide formed on the conductive metal substrate, wherein the amount of coating of iridium per time for the catalyst layer is 2 g/m 2  or more and the degree of crystallinity of iridium oxide in the catalyst layer after the post-bake is made to be 80% or more. 
     
     
         3 . The anode for oxygen generation, as in  claim 1 , comprising the conductive metal substrate and the catalyst layer containing iridium oxide formed on the conductive metal substrate, wherein the amount of coating of iridium per time for the catalyst layer is 2 g/m 2  or more and the crystallite diameter of iridium oxide in the catalyst layer is made to be 9.0 nm or less. 
     
     
         4 . The anode for oxygen generation, as in  claim 1 , comprising the conductive metal substrate and the catalyst layer containing iridium oxide formed on the conductive metal substrate, wherein an arc ion plating base layer containing tantalum and titanium ingredients is formed by the arc ion plating process on the conductive metal substrate before the formation of the catalyst layer. 
     
     
         5 . A manufacturing method for an anode for oxygen generation comprising a conductive metal substrate and a catalyst layer containing iridium oxide, comprising:
 forming a catalyst layer containing amorphous iridium oxide on the conductive metal substrate by baking in a high temperature region of 430 degrees Celsius-480 degrees Celsius; and   post-baking the catalyst layer containing amorphous iridium oxide in a high temperature region of 520 degrees Celsius-600 degrees Celsius to crystallize almost all amount of iridium oxide in the catalyst layer,   
       wherein the amount of coating of iridium per time for the catalyst layer is 2 g/m 2  or more. 
     
     
         6 . The manufacturing method for the anode for oxygen generation, as in  claim 5 , wherein the amount of coating of iridium per time for the catalyst layer is 2 g/m 2  or more and the catalyst layer containing amorphous iridium oxide is formed on the surface of the conductive metal substrate by baking in a high temperature region of 430 degrees Celsius-480 degrees Celsius and the catalyst layer containing amorphous iridium oxide is post-baked in a high temperature region of 520 degrees Celsius-600 degrees Celsius to make the degree of crystallinity of iridium oxide in the catalyst layer to be 80% or more. 
     
     
         7 . The manufacturing method for the anode for oxygen generation, as in  claim 5 , wherein the amount of coating of iridium per time for the catalyst layer is 2 g/m 2  or more and the catalyst layer containing amorphous iridium oxide is formed on the surface of the conductive metal substrate by baking in a high temperature region of 430 degrees Celsius-480 degrees Celsius and the catalyst layer containing amorphous iridium oxide is post-baked in a high temperature region of 520 degrees Celsius-600 degrees Celsius to make crystallite diameter of iridium oxide in the catalyst layer to be 9.0 nm or less. 
     
     
         8 . The manufacturing method for the anode for oxygen generation, as in  claim 5 , comprising the conductive metal substrate and the catalyst layer containing iridium oxide formed on the conductive metal substrate, wherein the arc ion plating base layer containing tantalum and titanium ingredients is formed by the arc ion plating process on the conductive metal substrate before the formation of the catalyst layer.