Substrate Temperature Regulating Device and Substrate Processing Apparatus Using the Same
Abstract
Provided is a device for regulating a temperature of a substrate within a chamber of a substrate processing apparatus, which includes: a mounting stand configured to mount the substrate thereon and including a temperature regulating medium flow path formed therein; a substrate elevating mechanism configured to move the substrate up and down between a first position and a second position; a first temperature regulating unit configured to supply a temperature regulating medium to the flow path and configured to regulate the temperature of the substrate to a first temperature in the first position; a second temperature regulating unit installed below the mounting stand and configured to regulate the substrate to a second temperature by emitting light toward the substrate in the second position and heating the substrate; and a light transmitting window configured to transmit the light emitted from the second temperature regulating unit.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A substrate temperature regulating device for regulating a temperature of a substrate within a chamber of a substrate processing apparatus, the device comprising:
a mounting stand configured to mount the substrate thereon, the mounting stand including a temperature regulating medium flow path formed therein; a substrate elevating mechanism configured to move the substrate up and down between a first position defined on the mounting stand and a second position defined above the mounting stand; a first temperature regulating unit configured to supply a temperature regulating medium to the temperature regulating medium flow path and configured to regulate the temperature of the substrate to a first temperature in the first position; a second temperature regulating unit installed below the mounting stand and configured to regulate the substrate to a second temperature by emitting light toward the substrate positioned in the second position and heating the substrate, the light having a wavelength that is absorbed by the substrate; and a light transmitting window installed in the mounting stand and configured to transmit the light emitted from the second temperature regulating unit.
2 . The device of claim 1 , wherein the second temperature regulating unit is installed below the mounting stand, and the light transmitting window includes a light transmitting member fitted to a transmission hole in the mounting stand, where the transmission hole extends through the mounting stand from the front surface to the rear surface.
3 . The device of claim 2 , wherein the light transmitting member of the light transmitting window includes a first light transmitting member and a second light transmitting member, and a space defined between the first light transmitting member and the second light transmitting member,
wherein the space serves as a portion of the temperature regulating medium flow path.
4 . The device of claim 3 , wherein the temperature regulating medium is a liquid that transmits the light emitted from the second temperature regulating unit.
5 . The device of claim 4 , wherein the temperature regulating medium is selected from a group consisting of a fluorine-based coolant and water.
6 . The device of claim 3 , wherein the first light transmitting member has a front surface flush with the front surface of the mounting stand.
7 . The device of claim 3 , wherein the first light transmitting member is made of sapphire.
8 . The device of claim 3 , wherein the second light transmitting member is made of quartz.
9 . The device of claim 1 , wherein at least a front surface of the mounting stand is made of aluminum
10 . The device of claim 1 , wherein the second temperature regulating unit includes:
a light emitting element array having a plurality of light emitting elements supported on a support body; a cooling plate configured to support the light emitting element array and configured to cool the light emitting elements; and a power supply unit configured to supply electric power to the light emitting elements.
11 . A substrate processing apparatus for processing a substrate at different temperature settings, comprising:
a chamber configured to accommodate the substrate; and a substrate temperature regulating device of claim 1 installed in a bottom portion of the chamber, wherein the substrate temperature regulating device is configured to regulate a temperature of the substrate at a first temperature during a first process and to a second temperature during a second process.
12 . The apparatus of claim 11 , further comprising:
a process gas supply system configured to supply a process gas to the chamber; and an exhaust unit configured to evacuate an inside of the chamber.
13 . The apparatus of claim 12 , further comprising:
a shower head installed in a top portion of the chamber and configured to introduce the process gas into the chamber.
14 . The apparatus of claim 12 , further comprising:
a plasma source installed in a top portion of the chamber and configured to convert the process gas to plasma within the chamber.Join the waitlist — get patent alerts
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