Plasma generator apparatus
Abstract
Embodiments of a plasma generator apparatus for ashing a work piece are provided. The apparatus includes a container adapted for continuous gas flow there through from an inlet end to an outlet end thereof. The container is fabricated of a dielectric material and adapted for ionization therein of a portion of at least one component of gas flowing therethrough. A gas flow distributor is configured to direct gas flow to a region within the container and a coil surrounds at least a portion of side walls of the container adjacent the region of the container to which the gas flow distributor directs gas flow. A radio frequency generator is coupled to the coil.
Claims
exact text as granted — not AI-modified1 .- 19 . (canceled)
20 . A remote plasma generator configured to treat a substrate comprising:
a container comprising an upper portion and a lower portion, the upper portion and the lower portion adjoined to form an intersection, a part of the upper portion and a part of the lower portion being surrounded by a symmetrical coil, the symmetrical coil connected to a first capacitor at one end of the symmetrical coil and to a second capacitor at the other end of the symmetrical coil; a gas distribution nozzle attached to a top end of the upper portion, the gas distribution nozzle comprising a hemispherical tip having a first plurality of through holes configured for preferentially directing an incoming flow of gas along sidewalk of the upper portion and toward sidewalls of the lower portion to form a region of higher gas density to provide a higher plasma density inside the container proximate the intersection than in regions not proximate the intersection; and a gas distribution plate attached to the a bottom end of the lower portion, the gas distribution plate comprising a second plurality of through holes for distributing and directing an outgoing flow of the gas out of the remote plasma generator and to the substrate positioned outside of the remote plasma generator, the gas distribution plate having a diameter substantially the same as the substrate.
21 . The remote plasma generator of claim 20 , wherein the upper portion is conical or domed.
22 . The remote plasma generator of claim 21 , wherein the conical or domed upper portion has a narrow end and a wide end, the wide end connected to a top end of the lower portion at the intersection, the gas distribution nozzle attached to the narrow end of the conical or domed upper portion of the container.
23 . The remote plasma generator of claim 20 , wherein the lower portion is cylindrical.
24 . The remote plasma generator of claim 20 , wherein the first plurality of through holes are configured to direct the incoming flow of the gas in a direction substantially parallel to the sidewalls of the upper portion of the container.
25 . The remote plasma generator of claim 20 , wherein the second plurality of through holes are configured to distribute and direct the outgoing flow of the gas out of the remote plasma generator in a direction substantially perpendicular to the substrate.
26 . The remote plasma generator of claim 20 , wherein the first plurality of through holes are arranged in a circle on the hemispherical tip of the gas distribution nozzle.
27 . The remote plasma generator of claim 20 , wherein the symmetrical coil comprises a third capacitor interconnecting two segments of the symmetrical coil.
28 . The remote plasma generator of claim 27 , wherein the two segments are connected in series, and wherein the first capacitor is connected to a power supply and the second capacitor is connected to an electrical ground connection.
29 . The remote plasma generator of claim 20 , further comprising a Faraday shield positioned between the symmetrical coil and part of the upper portion of the container, and between the symmetrical coil and part of the lower portion of the container.
30 . The remote plasma generator of claim 20 , wherein the remote plasma generator is free of a Faraday shield in between the symmetrical coil and the container.
31 . The remote plasma generator of claim 20 , wherein the symmetrical coil is configured to produce a plasma-generating energy field having a peak power proximate the intersection between the upper portion and the lower portion of the container.
32 . The remote plasma generator of claim 20 , wherein the diameter of the gas distribution plate is between about 200 mm and 500 mm.
33 . The remote plasma generator of claim 20 , wherein the container comprises quartz.
34 . A remote plasma generator configured to treat a substrate comprising:
a container comprising an conical or domed upper portion and a cylindrical lower portion, the conical or domed upper portion and the cylindrical lower portion adjoined to form an intersection, a part of the conical or domed upper portion and a part of the cylindrical lower portion being surrounded by a symmetrical coil, the symmetrical coil connected to a first capacitor at one end of the symmetrical coil and to a second capacitor at the other end of the symmetrical coil; a gas distribution nozzle attached to a top end of the conical or domed upper portion, the gas distribution nozzle comprising a hemispherical tip having a first plurality of through holes configured for preferentially directing an incoming flow of gas along sidewalk of the conical or domed upper portion and toward sidewalk of the cylindrical lower portion to form a region of higher gas density to provide a higher plasma density inside the container proximate the intersection than in regions not proximate the intersection; and a gas distribution plate attached to the a bottom end of the lower portion of the container, the gas distribution plate comprising a second plurality of through holes for distributing and directing an outgoing flow of the gas out of the remote plasma generator and to the substrate positioned outside of the remote plasma generator.
35 . The remote plasma generator of claim 34 , wherein the conical or domed upper portion has a narrow end and a wide end, the wide end connected to a top end of the cylindrical lower portion at the intersection, the gas distribution nozzle attached to the narrow end of the conical or domed upper portion of the container.
36 . The remote plasma generator of claim 34 , wherein the first plurality of through holes are configured to direct the incoming flow of the gas in a direction substantially parallel to the sidewalls of the conical or domed upper portion of the container.
37 . The remote plasma generator of claim 34 , wherein the symmetrical coil comprises a third capacitor interconnecting two segments of the symmetrical coil.
38 . The remote plasma generator of claim 34 , further comprising a Faraday shield positioned between the symmetrical coil and part of the upper portion of the container, and between the symmetrical coil and part of the lower portion of the container.
39 . The remote plasma generator of claim 34 , wherein the remote plasma generator is free of a Faraday shield in between the symmetrical coil and the container.Join the waitlist — get patent alerts
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