US2015048145A1PendingUtilityA1
Controlling the melt front of thin film applications
Est. expiryAug 14, 2033(~7.1 yrs left)· nominal 20-yr term from priority
H10P 14/69394H10P 14/69391H10P 14/6938H10P 14/6932H10P 14/6929H10P 14/2906H10P 14/68H10P 14/65H10P 14/00H10P 95/00H10P 90/1914B32B 2457/14B32B 1/00B32B 37/06B23K 37/00B32B 37/003B32B 9/041B23K 37/06B23K 3/04B32B 15/00B32B 37/04B32B 37/10
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Claims
Abstract
Systems and methods for bonding include selectively heating an initial location of a sample to melt a bonding layer at an interface between a first layer and a second layer of the sample. The heating is propagated in a direction away from the initial location such that a melt front of the bonding layer is translated across the interface to provide a void free bond between the first layer and the second layer.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A system for bonding, comprising:
a controller configured to control a plurality of heating elements to selectively heat an initial location of a sample to melt a bonding layer at an interface between a first layer and a second layer of the sample, and propagate the heating in a direction away from the initial location such that a melt front of the bonding layer is translated across the interface to provide a void free bond between the first layer and the second layer.
2 . The system as recited in claim 1 , wherein the first layer includes a thin film and the second layer includes a substrate.
3 . The system as recited in claim 1 , wherein the bonding layer includes a bonding metallization layer.
4 . A system for bonding, comprising:
a plurality of heating elements; and a controller configured to control the plurality of heating elements to selectively heat an initial location of a sample to melt a bonding layer at an interface between a first layer and a second layer of the sample, and propagate the heating in a direction away from the initial location such that a melt front of the bonding layer is translated across the interface to provide a void free bond between the first layer and the second layer.
5 . The system as recited in claim 4 , further comprising a vacuum configured to control an environment of the sample.
6 . The system as recited in claim 5 , further comprising a gas introduced in the vacuum to alter the surface of the bonding layers.
7 . The system as recited in claim 4 , further comprising a membrane configured to conform over a surface of the sample for improved thermal contact.
8 . The system as recited in claim 4 , wherein the direction is selected based on at least one of a shape and size of the sample.
9 . The system as recited in claim 4 , wherein the direction includes at least one of side to side and center to edge.
10 . The system as recited in claim 4 , wherein the first layer includes a thin film and the second layer includes a substrate.
11 . The system as recited in claim 4 , wherein the bonding layer includes a bonding metallization layer.Join the waitlist — get patent alerts
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