Chamber system and heat-insulating panel

Abstract

A chamber system includes: a housing section that is surrounded by a bottom part, a side wall part, and a ceiling part and houses a processing apparatus; and a heat-insulating section that is provided in each of the bottom part, the side wall part, and the ceiling part, and regulates transfer of heat between the housing section and the outside of the housing section.

1 - 26 . (canceled) 
     
     
         27 . A chamber system comprising:
 a housing section that is surrounded by a bottom part, a side wall part, and a ceiling part and houses a processing apparatus;   an atmosphere-adjusting section that adjusts the atmosphere inside the housing section; and   an aerial vibration-attenuating section that is provided in each of the side wall part, the ceiling part, and the atmosphere-adjusting section and attenuates aerial vibration outside the housing section.   
     
     
         28 - 37 . (canceled) 
     
     
         38 . The chamber system according to  claim 27 ,
 wherein the atmosphere-adjusting section has a gas supply system that supplies gas to the housing section, and   wherein the aerial vibration-attenuating section is provided in the gas supply system.   
     
     
         39 . The chamber system according to  claim 38 ,
 wherein the gas supply system has a first branch path and a second branch path that are branched, and the first branch path and the second branch path have different path lengths.   
     
     
         40 . The chamber system according to  claim 27 ,
 wherein the atmosphere-adjusting section has an exhaust system that exhausts gas from the housing section, and   wherein the aerial vibration-attenuating section is provided in the exhaust system.   
     
     
         41 . The chamber system according to  claim 27 ,
 wherein the atmosphere-adjusting section has a circulation system that exhausts a gas from the housing section and returns the exhausted gas to the housing section, and   wherein the aerial vibration-attenuating section is provided in the circulation system.   
     
     
         42 . The chamber system according to  claim 27 ,
 wherein the atmosphere-adjusting section has a flow passage through which the gas flows, and   wherein the aerial vibration-attenuating section is provided at a position according to the shape of the flow passage in the flow passage.   
     
     
         43 . The chamber system according to  claim 27 ,
 wherein the bottom part and the ceiling part are formed so that the surface of the bottom part on the housing section side and the surface of the ceiling part on the housing section side do not become parallel to each other.   
     
     
         44 . The chamber system according to  claim 27 ,
 wherein the side wall part has a plurality of surfaces on the housing section side, and is formed so that at least two of the plurality of surfaces do not become parallel to each other.   
     
     
         45 . The chamber system according to  claim 43 ,
 wherein at least one of the bottom part, the side wall part, and the ceiling part has a plurality of irregular portions.   
     
     
         46 . The chamber system according to  claim 27 ,
 wherein the aerial vibration-attenuating section has:   a detecting unit that detects the frequency of aerial vibration in the housing section; and   a control unit that performs a control so that vibration corresponding to a frequency according to a detection result of the detecting unit is generated in at least some of the bottom part, the side wall part, the ceiling part, and the atmosphere-adjusting section.   
     
     
         47 . The chamber system according to  claim 27 ,
 wherein the aerial vibration-attenuating section has an absorbing member that absorbs the aerial vibration.   
     
     
         48 . (canceled) 
     
     
         49 . The chamber system according to  claim 27 ,
 wherein the aerial vibration-attenuating section has a sound absorption portion that absorbs the aerial vibration.   
     
     
         50 . The chamber system according to  claim 27 ,
 wherein the aerial vibration-attenuating section has a resonating portion that resonates with the aerial vibration.   
     
     
         51 . The chamber system according to  claim 50 ,
 wherein the aerial vibration-attenuating section is formed so that Helmholtz resonance is generated in the resonating portion.   
     
     
         52 . The chamber system according to  claim 50 ,
 wherein the resonating portion has:   a base portion having a recess formed therein;   a lid portion that covers the base portion so as to block the recess; and   a communication portion that is formed in the lid portion and allows the inside of the recess and the outside of the recess to communicate with each other.   
     
     
         53 . The chamber system according to  claim 52 ,
 wherein at least one of the recess and the communication portion is formed with a specification according to the frequency of the aerial vibration.   
     
     
         54 . The chamber system according to  claim 52 ,
 wherein the communication portion is formed on the housing section side so as to allow the inside of the recess and the inside of the housing section to communicate with each other.   
     
     
         55 . The chamber system according to  claim 52 ,
 wherein the lid portion is formed using metal.   
     
     
         56 . The chamber system according to  claim 52 ,
 wherein the resonating portion has a lid portion-supporting portion that is provided in the recess and supports the lid portion.   
     
     
         57 . The chamber system according to  claim 56 ,
 wherein the resonating portion is provided in at least the bottom part, and   wherein the processing apparatus is placed on the resonating portion.   
     
     
         58 . The chamber system according to  claim 57 ,
 wherein a plurality of the lid portion-supporting portions are provided, and   wherein the plurality of lid portion-supporting portions are arranged so that the density of the portions thereof corresponding to the processing apparatus becomes higher than that of the other portions.   
     
     
         59 . The chamber system according to  claim 27 ,
 wherein the processing apparatus includes at least one of a measuring apparatus, a manufacturing apparatus, and a machining apparatus.