Chemical vapor deposition apparatus

Abstract

A chemical vapor deposition apparatus and a method for forming a parylene film are provided. The chemical vapor deposition apparatus includes a buffer chamber, a deposition chamber, a pyrolysis chamber, an evaporator, and a sorter. The buffer chamber has a first valve, a second valve, and a carrying apparatus. The evaporator is connected with the second valve. The pyrolysis chamber is connected with the evaporator through a first pipe, wherein the first pipe has a third valve. The deposition chamber is connected with the pyrolysis chamber. The sorter is connected with the buffer chamber through the first valve.

What is claimed is: 
     
         1 . A chemical vapor deposition apparatus, comprising:
 a buffer chamber, having a first valve, a second valve, and a carrying apparatus;   an evaporator, connected with the second valve;   a pyrolysis chamber, connected with the evaporator through a first pipe, wherein the first pipe has a third valve;   a deposition chamber, connected with the pyrolysis chamber; and   a sorter connected with the buffer chamber through the first valve.   
     
     
         2 . The chemical vapor deposition apparatus as claimed in  claim 1 , wherein the deposition chamber has a fourth valve and the pyrolysis chamber is connected with the deposition chamber through the fourth valve. 
     
     
         3 . The chemical vapor deposition apparatus as claimed in  claim 1 , wherein the evaporator comprises a material receiving region and an evaporation region, wherein the material receiving region is configured to receive a material and the evaporation region is configured to heat up the material. 
     
     
         4 . The chemical vapor deposition apparatus as claimed in  claim 1 , wherein the evaporator further comprises a material receiving apparatus movably disposed in the evaporator. 
     
     
         5 . The chemical vapor deposition apparatus as claimed in  claim 1 , further comprising a cold trap connected with the evaporator through a second pipe, wherein the second pipe has a fifth valve. 
     
     
         6 . The chemical vapor deposition apparatus as claimed in  claim 5 , wherein the fifth valve is an air actuated valve. 
     
     
         7 . The chemical vapor deposition apparatus as claimed in  claim 1 , wherein the first valve and the second valve are gate valves respectively. 
     
     
         8 . The chemical vapor deposition apparatus as claimed in  claim 1 , wherein the third valve is an air actuated valve. 
     
     
         9 . The chemical vapor deposition apparatus as claimed in  claim 2 , wherein the fourth valve is a gate valve. 
     
     
         10 . The chemical vapor deposition apparatus as claimed in  claim 5 , further comprising a pump connected with the cold trap through a third pipe.