Transparent conductive layer and cf substrate having same and manufacturing method thereof

Abstract

The present invention provides a transparent conductive layer and a CF substrate having the transparent conductive layer and a manufacturing method thereof. The transparent conductive layer is made of a graphene transparent conductive material and is in the form of a thin film having a thickness of 0.36 nm-10 nm, transmittance of visible light being 80-97%, and surface resistance being 30-500Ω/□ and can replace a conventional ITO transparent conductive layer and has improved mechanical strength and flexibility. The CF substrate having the graphene transparent conductive layer uses the graphene transparent conductive layer to replace the ITO transparent conductive layer used in a CF substrate in order to obtain an electrode or a static electricity draining layer having high transmittance and excellent flexibility and, when used in a liquid crystal display panel, helps improve the transmittance of the liquid crystal panel and reduce the use of backlighting. The manufacturing method of the CF substrate having the graphene transparent conductive layer uses a CVD process to form graphene on a growth substrate to be subsequently transferred to a CF substrate body, of which the manufacture is easy and cost is low.

What is claimed is: 
     
         1 . A transparent conductive layer, which is made of a graphene transparent conductive material and is in the form of a thin film having a thickness of 0.36 nm-10 nm, transmittance of visible light being 80-97%, and surface resistance being 30-500Ω/□. 
     
     
         2 . A color filter (CF) substrate, comprising: a CF substrate body and a transparent conductive layer formed on the CF substrate body, the transparent conductive layer being made of a graphene transparent conductive material in the form of a thin film having a thickness of 0.36 nm-10 nm, transmittance of visible light being 80-97%, and surface resistance being 30-500Ω/□. 
     
     
         3 . The CF substrate as claimed in  claim 2 , wherein the CF substrate body comprises a glass substrate and a color resist layer formed on the glass substrate, the color resist layer comprising a plurality of pixel units that is arranged in an array and a black matrix arranged around an outer circumference of the pixel units. 
     
     
         4 . The CF substrate as claimed in  claim 3 , wherein the transparent conductive layer is arranged on the color resist layer. 
     
     
         5 . The CF substrate as claimed in  claim 3 , wherein the transparent conductive layer and the color resist layer are respectively arranged on two opposite surfaces of the glass substrate. 
     
     
         6 . A manufacturing method of a CF substrate, comprising the following steps:
 ( 11 ) placing a growth substrate in a chemical vapor deposition reactor and introducing a mixed gas of a carbon source gas and a carrier gas to carry out a reaction under the conditions of 900-1120° C. and 40 Pa-5000 KPa for 1-60 min so as to grow a graphene film on the growth substrate, wherein the graphene film has a thickness of 0.36 nm-10 nm, transmittance of visible light being 80-97%, and surface resistance being 30-500Ω/□;   ( 12 ) coating a transfer medium layer on the graphene film to obtain a combination of transfer medium layer/graphene film/growth substrate;   ( 13 ) dipping the combination of transfer medium layer/graphene film/growth substrate in a growth substrate corrosive liquid to remove the growth substrate so as to obtain a combination of transfer medium layer/graphene film;   ( 14 ) providing a CF substrate body, wherein the CF substrate body comprises a glass substrate and a color resist layer formed on the glass substrate;   ( 15 ) positioning the combination of transfer medium layer/graphene film on the CF substrate body to proceed with transferring in room temperature so as to obtain a combination of transfer medium layer/graphene film/CF substrate body; and   ( 16 ) placing and washing the combination of transfer medium layer/graphene film/CF substrate body in a transfer medium layer removing solvent to remove the transfer medium layer so as to obtain a graphene film on the CF substrate body and thus forming a transparent conductive layer on the CF substrate body.   
     
     
         7 . The manufacturing method of a CF substrate as claimed in  claim 6 , wherein in step ( 15 ), the combination of transfer medium layer/graphene film is positioned on the color resist layer of the CF substrate body; and in step ( 16 ), the transparent conductive layer is formed on the color resist layer of the CF substrate body. 
     
     
         8 . The manufacturing method of a CF substrate as claimed in  claim 6 , wherein in step ( 15 ), the combination of transfer medium layer/graphene film is positioned on the glass substrate of the CF substrate body; and in step ( 16 ), the transparent conductive layer is formed on the glass substrate of the CF substrate body. 
     
     
         9 . The manufacturing method of a CF substrate as claimed in  claim 6 , wherein the carbon source gas is methane, ethylene, or acethylene; the carrier gas is hydrogen or a mixed gas of hydrogen and argon; the growth substrate is a metal foil made of Ni, Cu, or Ru; the growth substrate corrosive liquid is FeCl 3  solution or an acid solution; and the transfer medium layer is poly methyl methacrylate or poly dimethyl acrylamide. 
     
     
         10 . The manufacturing method of a CF substrate as claimed in  claim 9 , wherein the carbon source gas is methane; the carrier gas is hydrogen; the growth substrate is a Cu foil, the copper foil having a purity≧99%; the transfer medium layer is poly methyl methacrylate; the growth substrate corrosive liquid is 0.1-1.5 mol/L FeCl 3  solution; and the transfer medium layer removing solvent is acetone alcohol solution.