Method for fabricating pad conditioning tool

Abstract

A method for fabricating a pad conditioning tool includes the steps: preparing a sapphire substrate with a specific orientation plane, wherein the specific orientation plane is selected from a group consisting of a-plane, c-plane, r-plane, m-plane, n-plane and v-plane; utilizing screen printing technique and a screen plate in order to transfer an image pattern such that upon solidifying one side surface of the sapphire substrate is imprinted with the image pattern; and performing an etching process on the side surface of the sapphire substrate such that the side surface is formed with a plurality of micro particles of specific structures.

What is claimed is: 
     
         1 . A method for fabricating a pad conditioning tool comprising the steps:
 preparing a sapphire substrate with a specific orientation plane, wherein said specific orientation plane is selected from a group consisting of a-plane, c-plane, r-plane, m-plane, n-plane and v-plane;   utilizing screen printing technique and a screen plate in order to transfer an image pattern such that upon solidifying one side surface of said sapphire substrate is imprinted with said image pattern; and   performing an etching process on said side surface of said sapphire substrate such that said side surface is formed with a plurality of micro particles of specific structures.   
     
     
         2 . The method according to  claim 1 , wherein materials for transferring said image pattern includes polymer or oligomer or monomer; a photoactive compound (PAC) or photo initiator; an additive, wherein said additive is one of durable wet etching or dry etching materials; and a solvent. 
     
     
         3 . The method according to  claim 2 , wherein said durable wet etching materials includes nano-scale particles of SiO 2  or TiO 2 . 
     
     
         4 . The method according to  claim 1 , wherein said sapphire substrate further has another side surface imprinted with another one of said image pattern. 
     
     
         5 . The method according to  claim 1 , wherein said sapphire substrate has opposite side surfaces which are imprinted with said image patterns via said screen printing transfer technique. 
     
     
         6 . The method according to  claim 1 , wherein said image pattern imprinted on said side surface of said sapphire substrate via said screen printing transfer technique has a thickness greater than 50 μm. 
     
     
         7 . The method according to  claim 1 , wherein said image pattern imprinted on said side surface of said sapphire substrate via said screen printing transfer technique has a thickness greater than 100 μm. 
     
     
         8 . The method according to  claim 1 , wherein said image pattern imprinted on said side surface of said sapphire substrate via said screen printing transfer technique is generally circular and has a diameter smaller than 50 μm. 
     
     
         9 . The method according to  claim 1 , wherein said image pattern imprinted on said side surface of said sapphire substrate via said screen printing transfer technique is generally circular and has a diameter smaller than 20 μm. 
     
     
         10 . The method according to  claim 1 , wherein said screen plate is selected from a group consisting of a natural screen fabric, a composite fabric and a metal fabric. 
     
     
         11 . The method according to  claim 1 , wherein said etching process is selected from a group consisting of a wet etching process and a dry etching process. 
     
     
         12 . The method according to  claim 1 , wherein each of said sapphire dressing particles is shaped like a symmetric truncated cone with a flat head, a symmetric cone, an asymmetric truncated cone with a flat head and an asymmetric cone.