Diffraction Grating and Method for the Production Thereof
Abstract
A diffraction grating includes a grating area having, in a direction running parallel to a substrate, a periodic arrangement of first areas with a first grating material and second areas with a second grating material. The first grating material and the second grating material are solid materials with different indices of refraction. A reflection-reducing or reflection-increasing layer system having at least two layers with different indices refraction. The reflection-reducing or reflection-increasing layer system is arranged on one side of the grating area facing away from the substrate, and an additional layer system having at least two layers with different indices of refraction is arranged between the substrate and the grating area. A method for producing the diffraction grating is also specified.
Claims
exact text as granted — not AI-modified1 - 12 . (canceled)
13 . A diffraction grating, comprising:
a substrate; a grating region comprising, in a direction extending parallel to the substrate, a periodic arrangement of first regions having a first grating material and second regions having a second grating material, wherein the first grating material and the second grating material are solid materials having different indices of refraction; a first layer system arranged on a side of the grating region facing away from the substrate, wherein the first layer system comprises a reflection-reducing or reflection-increasing layer system that has a plurality of layers having different indices of refraction; and a further layer system arranged between the substrate and the grating region and that has a plurality of layers having different indices of refraction.
14 . The diffraction grating according to claim 13 , wherein the diffraction grating is a transmission grating, and wherein the first layer system and the further layer system are each reflection-reducing layer systems.
15 . The diffraction grating according to claim 13 , wherein the diffraction grating is a reflection grating and wherein the first layer system is a reflection-increasing layer system and the further layer system is a reflection-reducing layer system.
16 . The diffraction grating according to claim 13 , wherein the diffraction grating is a reflection grating and wherein the first layer system is a reflection-reducing layer system and the further layer system is a reflection-increasing layer system.
17 . The diffraction grating according to claim 13 , wherein the first grating material has an index of refraction n1>1 and the second grating material has an index of refraction n2>n1, wherein n2−n1≧0.4.
18 . The diffraction grating according to claim 13 , wherein the grating region has a thickness between 200 nm and 2000 nm.
19 . The diffraction grating according to claim 13 , wherein the periodic arrangement has a period length of less than 5 μm.
20 . The diffraction grating according to claim 13 , wherein the first grating material and the second grating material comprise dielectric materials.
21 . The diffraction grating according to claim 13 , wherein the layers of the first layer system and/or the layers of the further layer system have a first layer material and a second layer material, wherein the first layer material is identical to the first grating material and/or the second layer material is identical to the second grating material.
22 . The diffraction grating according to claim 13 , wherein the first layer system and/or the further layer system has at least three layers having alternating indices of refraction.
23 . A method for producing a diffraction grating, the method comprising:
forming a periodic arrangement of recesses in a substrate or in a layer overlying the substrate; forming a grating region by filling the recesses with a further solid material, so that a solid material of the substrate or layer functions as a first grating material and the further solid material functions as a second grating material, wherein the first grating material and the second grating material have different indices of refraction; depositing a first layer system that has a plurality of layers having different indices of refraction; and after depositing the first layer system, depositing a second layer system that includes a plurality of layers having different indices of refraction, the second layer system comprising a reflection-reducing or reflection-increasing layer system.
24 . The method according to claim 23 , wherein filling of the recesses with the second grating material comprises performing atomic layer deposition (ALD).
25 . The method according to claim 23 , wherein the diffraction grating is a reflection grating, wherein the second layer system is a reflection-increasing layer system, and wherein the first layer system is a reflection-reducing layer system.
26 . The method according to claim 23 , wherein the diffraction grating is a reflection grating, the second layer system is a reflection-reducing layer system, and the first layer system is a reflection-increasing layer system.
27 . The method according to claim 23 , wherein the first grating material and the second grating material are dielectric materials.
28 . The method according to claim 23 , wherein forming the periodic arrangement of recesses comprises forming the recesses in the substrate.
29 . The method according to claim 23 , wherein forming the periodic arrangement of recesses comprises forming the recesses the layer overlying the substrate.Join the waitlist — get patent alerts
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