Porous framework and method for its manufacture

Abstract

A method for fabricating a porous framework includes contacting a substrate with a solution containing a plurality of component materials are dissolved in the solution. A solid composite made of the plurality of component materials is electrodeposited onto the substrate. A plurality of electrodepositing voltages is applied to vary a relative proportion of the component materials in the composite being electrodeposited, and at least one of the plurality of component materials is selectively etched away from the composite to form a plurality of pores.

What is claimed is: 
     
         1 . A method for fabricating a porous framework comprising:
 contacting a substrate with a solution wherein a plurality of component materials are dissolved in the solution;   electrodepositing onto the substrate a solid composite comprising the plurality of component materials, wherein the electrodepositing comprises applying a plurality of voltages to vary a relative proportion of the component materials in the electrodeposited composite; and   selectively etching away at least one of the plurality of component materials from the composite to form a plurality of pores in the substrate.   
     
     
         2 . The method of  claim 1 , wherein a component material comprises at least one of a metal and a conductive non-metal. 
     
     
         3 . The method of  claim 1 , wherein a component material comprises at least one of a ceramic and a polymer. 
     
     
         4 . The method of  claim 1 , wherein a surface geometry feature of the substrate comprises at least one of a flat, corrugated, patterned, and arbitrary shape. 
     
     
         5 . The method of  claim 1 , further comprising treating an inner surface of the plurality of pores by at least one of altering a chemical composition of the surface, altering a structural feature of the surface, and applying a coating to the surface. 
     
     
         6 . The method of  claim 5 , wherein treating comprises at least one of heating, oxidizing, and attaching a chemical species. 
     
     
         7 . The method of  claim 6 , wherein the chemical species comprises at least one of an organic molecule, an inorganic molecule, a biomolecule, an electroactive material, and a polymer. 
     
     
         8 . The method of  claim 6 , wherein the chemical species is a nickel-oxide. 
     
     
         9 . The method of  claim 1 , further comprising placing a chemical species comprising at least one of organic molecules, inorganic molecules, biomolecules, and polymers in the plurality of pores. 
     
     
         10 . The method of  claim 1 , wherein the plurality of electrodepositing voltages comprises at least one of a linear curve of electrodepositing voltages, a non-linear curve of electrodepositing voltages, and a periodic curve of electrodepositing voltages. 
     
     
         11 . The method of  claim 10 , wherein the periodic curve of electrodepositing voltages comprises at least one of a sine wave, a square wave, a sawtooth wave, and a triangle wave, 
     
     
         12 . The method of  claim 1 , wherein the etching comprises at least one of electrochemical etching and contacting the composite with an etching substance. 
     
     
         13 . The method of  claim 12 , wherein the etching substance comprises at least one of hydrochloric acid, ammonia, nitric acid, and hydrofluoric acid. 
     
     
         14 . The method of  claim 2 , wherein the metal comprises at least one of nickel, copper, zinc, silver, aluminum, and gold. 
     
     
         15 . A framework system comprising:
 a structure;   a plurality of pores in the structure;   a pore width along a length of a first pore of the plurality of pores, wherein the width is between 1 nanometer and 10 microns; and   an approximately predetermined variation in the pore width across the length of the first pore.   
     
     
         16 . The framework of  claim 15 , wherein a pore of the plurality of pores comprises a longitudinal axis, wherein the longitudinal axis of the pore is approximately orthogonal to a thickness of the structure. 
     
     
         17 . The framework of  claim 15 , wherein the structure comprises at least one of a metal and a conductive non-metal. 
     
     
         18 . The framework of  claim 17 , wherein the metal comprises at least one of nickel, copper, zinc, silver, aluminum, and gold. 
     
     
         19 . The framework of  claim 15 , wherein the structure comprises at least one of a ceramic and a polymer. 
     
     
         20 . The framework of  claim 15 , wherein the pore width is between 1 nanometer and 500 nanometers. 
     
     
         21 . The framework of  claim 15 , wherein the pore width is between 500 nanometers and 10 microns. 
     
     
         22 . The framework of  claim 15 , wherein the predetermined variation is at least one of an approximately linear-curved variation, an approximately non-linear curved variation, and an approximately periodic variation. 
     
     
         23 . The framework of  claim 22 , wherein the periodic variation is at least one of approximately sinusoidal variation, approximately square-waved variation, approximately sawtooth-waved variation, and approximately triangular-waved variation. 
     
     
         24 . The framework of  claim 15 , further comprising a substance attached to a surface of the plurality of pores, wherein the substance is at least one of all organic molecule, an inorganic molecule, an electroactive material, a biomolecule, and a polymer. 
     
     
         25 . The framework of  claim 24 , wherein the substance is a nickel oxide.