Photo-curable composition and patterning method using the same

Abstract

The present invention provides a photo-curable composition that requires a small demolding force. The present invention also provides a UV imprint method that requires a small demolding force. The photo-curable composition contains a polymerizable monomer (A), a polymerization initiator (B), and a fluorine-containing surfactant (C). A photo-cured product of the photo-curable composition has a water contact angle of 74 degrees or less.

1 . A photo-curable composition, comprising:
 a polymerizable monomer (A);   a polymerization initiator (B); and   a fluorine-containing surfactant (C),   wherein a photo-cured product of the photo-curable composition has a water contact angle of 74 degrees or less.   
     
     
         2 . The photo-curable composition according to  claim 1 , wherein the photo-cured product of the photo-curable composition has a water contact angle of 70 degrees or less. 
     
     
         3 . The photo-curable composition according to  claim 1 , wherein the fluorine-containing surfactant (C) has a polar functional group at one end. 
     
     
         4 . The photo-curable composition according to  claim 3 , wherein the fluorine-containing surfactant (C) has a perfluoroalkyl chain (C-a) at one end and a polar functional group (C-c) at the other end, and the perfluoroalkyl chain is linked to the polar functional group through a poly(alkylene oxide) chain (C-b1) or an alkyl chain (C-b2). 
     
     
         5 . The photo-curable composition according to  claim 3 , wherein the fluorine-containing surfactant (C) is at least one compound having the following general formula ( 1 ):
   F(CF 2 ) 6 (CH 2 ) m (OCH 2 CH 2 ) n OH  (1)
   wherein m is an integer in the range of 1 to 3, and n is an integer in the range of 1 to 100.   
     
     
         6 . The photo-curable composition according to  claim 1 , wherein the polymerization initiator (B) is 2,2-dimethoxy-2-phenylacetophenone. 
     
     
         7 . The photo-curable composition according to  claim 1 , wherein the polymerization initiator (B) is 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one. 
     
     
         8 . A patterning method, comprising:
 placing the photo-curable composition according to  claim 1  on a substrate to be processed;   bringing the photo-curable composition into contact with a mold;   irradiating the photo-curable composition with light; and   releasing the photo-curable composition from the mold after the irradiation to form a pattern out of the photo-curable composition on the substrate to be processed.   
     
     
         9 . The patterning method according to  claim 8 , wherein a surface of the mold in contact with the photo-curable composition is made of quartz. 
     
     
         10 . The patterning method according to  claim 8 , wherein the irradiation involves irradiating the photo-curable composition with light through the mold having recessed and raised portions on its surface. 
     
     
         11 . A method for manufacturing a circuit board, comprising: etching or implanting ions into a substrate in accordance with a pattern formed by the patterning method according to  claim 8 , thereby forming a circuit structure. 
     
     
         12 . An article, comprising: a substrate; and a cured product disposed on the substrate, the cured product having a pattern of the photo-curable composition according to  claim 1 . 
     
     
         13 . The photo-curable composition according to  claim 1 , wherein the composition is used for nanoimpirnts. 
     
     
         14 . A photo-curable composition for nanoimpirnts, comprising:
 a polymerizable monomer (A);   a polymerization initiator (B); and   a fluorine-containing surfactant (C),   wherein a photo-cured product of the photo-curable composition has a water contact angle of 70 degrees or less.