US2014349071A1PendingUtilityA1
Com/iphone method of making superoleophobic re-entrant resist structures
Est. expiryJul 16, 2032(~6 yrs left)· nominal 20-yr term from priority
B41J 2/165B41J 2/14B41J 2/1606B41J 2/162B41J 2/1642B41J 2/1646B41J 2/1631B41J 2/1628Y10T428/24364B41J 2/1629B41J 2/1645G03F 7/0035G03F 7/40
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Claims
Abstract
A device and method for preparing a device having a superoleophobic surface are disclosed. The method includes providing a substrate; coating a lift-off resist layer on the substrate; baking the lift-off resist layer; layering a photoresist layer on the lift-off resist layer; performing photolithography to create a textured pattern in the photoresist layer and the lift-off resist layer, and chemically modifying the textured pattern to create a superoleophobic surface.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A front face for an ink jet printhead, the front face comprising:
a flexible substrate, wherein the flexible substrate comprises
a plastic film;
a lift-off resist layer;
a photoresist layer,
wherein the lift-off resist layer and the photoresist layer form a textured pattern,
wherein the textured pattern comprises at least one overhang re-entrant structure; and
a conformal fluoropolymer or fluorosilane coating disposed on a surface of the textured pattern.
2 . The front face according to claim 1 , wherein the conformal coating is selected from the group consisting of fluorosilane layers synthesized from tridecafluoro-1,1,2,2-tetrahydrooctyltrichlorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane, tridecafluoro-1,1,2,2-tetrahydrooctyltriethoxysilane, heptadecafluoro-1,1,2,2-tetrahydrooctyltrichlorosilane, heptadecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane, and heptadecafluoro-1,1,2,2-tetrahydrooctyltriethoxysilane, a perfluoropolyether polymer and an amorphous fluoropolymer copolymerized from tetrafluoroethylene and 2,2-bis-trifluoromethyl-4,5-difluoro-1,3-dioxole, or combinations thereof.
3 . The front face according to claim 1 , wherein the lift-off resist layer comprises poly(methyl methacrylate).
4 . The front face according to claim 1 , wherein the lift-off resist layer comprises polymethylglutarimide.
5 . The front face according to claim 1 , wherein the textured pattern has a solid area coverage of about 0.5% to about 80% of the substrate.
6 . The front face according to claim 1 , wherein the texture pattern comprises overhang re-entrant structures, wherein the overhang re-entrant structures have height of about 0.1 microns to about 10 microns.
7 . The front face according to claim 1 , wherein the texture pattern comprises overhang re-entrant structures, wherein the overhang re-entrant structures have a thickness of about 0.1 microns to about 10 microns.
8 . The front face according to claim 1 , wherein the textured pattern is an overhang re-entrant structure with an undercut of about 0.1 microns to about 5 microns.
9 . The front face according to claim 1 , wherein the overhang re-entrant structure is an individual re-entrant structure or a continuous grooved structure.
10 . The front face according to claim 9 , wherein the individual re-entrant structures are spaced from about 0.5 μm to about 10 μm apart when measured from the centers of the individual re-entrant structures.
11 . The front face according to claim 9 , wherein the continuous groove structures have a length of at least about 3 times of the width.
12 . The front face according to claim 1 , wherein the lift-off resist layer has a thickness of from about 0.1 microns to about 10 microns.
13 . The front face according to claim 1 , wherein a static contact angle for hexadecane on the conformal coating is 151.
14 . A front face for an ink jet printhead, the front face comprising:
a flexible substrate, wherein the flexible substrate comprises
a plastic film;
a lift-off resist layer;
a photoresist layer,
wherein the lift-off resist layer and the photoresist layer form a textured pattern,
wherein the textured pattern comprises at least one overhang re-entrant structure; and
a conformal fluoropolymer or fluorosilane coating disposed on a surface of the textured pattern, wherein a hydrocarbon-based ink forms a contact-angle with a surface of the conformal coating disposed on the surface of the textured pattern that is greater than about 150°.
15 . A flexible device comprising a flexible substrate having a superoleophobic surface, wherein the flexible substrate comprises
a plastic film; a lift-off resist layer; a photoresist layer,
wherein the lift-off resist layer and the photoresist layer form a textured pattern,
wherein the textured pattern comprises at least one overhang re-entrant structure; and
a conformal fluoropolymer or fluorosilane coating disposed on a surface of the textured pattern, wherein the conformal coating disposed on the surface of the textured pattern comprises a superoleophobic surface.
16 . The flexible device according to claim 15 , wherein the conformal coating is selected from the group consisting of fluorosilane layers synthesized from tridecafluoro-1,1,2,2-tetrahydrooctyltrichlorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane, tridecafluoro-1,1,2,2-tetrahydrooctyltriethoxysilane, heptadecafluoro-1,1,2,2-tetrahydrooctyltrichlorosilane, heptadecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane, and heptadecafluoro-1,1,2,2-tetrahydrooctyltriethoxysilane, a perfluoropolyether polymer and an amorphous fluoropolymer copolymerized from tetrafluoroethylene and 2,2-bis-trifluoromethyl-4,5-difluoro-1,3-dioxole, or combinations thereof.
17 . The flexible device according to claim 15 , wherein the lift-off resist layer is a poly(methyl methacrylate) or a polymethylglutarimide layer.
18 . The front face according to claim 15 , wherein the textured pattern has a solid area coverage of about 0.5% to about 80% of the substrate.
19 . The front face according to claim 15 , wherein the conformal coating comprises a copolymer that is copolymerized from tetrafluoroethylene (TFE) and 2,2-bis-trifluoromethyl-4,5-difluoro-1,3-dioxole (BDD) monomers.
20 . The front face according to claim 15 , wherein the overhang re-entrant structure is an individual re-entrant structure or a continuous grooved structure.Join the waitlist — get patent alerts
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