Boronization Process and Composition with Improved Surface Characteristics of Metals

Abstract

Embodiments of the disclosed technology provide methods of boronizing titanium and other metals and metal alloys. The method proceeds, in an embodiment of the disclosed technology, by using a boron source, and placing it in a heated environment, followed by a reduced pressure environment, as is described in the disclosure. In a solid phase embodiment of the disclosure, boronized stainless steel alloys are produced having zero galling at 17,000 psi.

We claim: 
     
         1 . The boronized substrate of  claim 18 , wherein said substrate was boronized in the following mixture:
 a boron source selected from the group consisting of boron carbide, ferroboron, amorphous boron, and a combination thereof, said boron source comprising at least 90%, by weight of said mixture,   between 1% and 3%, by weight, zirconium oxide, and   between 1% and 2%, by weight, an activator.   
     
     
         2 . The boronized substrate of  claim 1 , wherein said mixture further comprises between 3% and 5%, by weight, aluminum oxide. 
     
     
         3 .  of  claim 1 , wherein said activator is potassium flouroborate. 
     
     
         4 .  of  claim 1 , wherein said boron source is boron carbide and said weight is 92%. 
     
     
         5 .  of  claim 2 , wherein said weight of aluminum oxide is 4%, said weight of zirconium oxide is 3%, and said weight of said activator is 1%. 
     
     
         6 .  of  claim 1 , wherein said mixture is kept above 250 degrees Celsius for at least two hours. 
     
     
         7 .  of  claim 1 , wherein said metal substrate comprises at least 50% titanium, by weight. 
     
     
         8 .  of  claim 7 , wherein said boron source is a combination of amorphous boron and boron carbide. 
     
     
         9 .  of  claim 8 , wherein amorphous boron is between 91% and 95% of said mixture, by weight, and boron carbide is between 2% and 7% of said mixture, by weight. 
     
     
         10 .  of  claim 9 , amorphous boron, comprises 95% of said mixture, by weight, boron carbide comprises 4% of said mixture, by weight, and an activator comprises 1% of said mixture, by weight. 
     
     
         11 . The boronized substrate of  claim 18  produced by:
 mixing a mixture of at least one of amorphous boron and boron carbide with an activator; 
 at least partially surrounding said metal substrate with said mixture; 
 carrying out said step of being boronized; 
 placing said mixture and substrate in an inert gas environment less than 150 mTorr; and 
 diffusing boron into said substrate. 
 
     
     
         12 . The boronized substrate of  claim 11 , wherein said substrate is selected from the group consisting of steel, nickel-based alloys, and transition metals. 
     
     
         13 . The boronized substrate of  claim 12 , wherein said substrate comprises, by weight, a majority of titanium. 
     
     
         14 . The boronized substrate of  claim 11 , wherein amorphous boron is between 91% and 95% by weight, and boron carbide is between 2% and 7% by weight. 
     
     
         15 . The boronized substrate of  claim 14 , wherein amorphous boron is 95% by weight and boron carbide is 4% by weight. 
     
     
         16 . The boronized substrate of  claim 11 , further comprising a step of heating to at least 150° C. for at least two hours after said step of mixing and before said step of surrounding. 
     
     
         17 . The boronized substrate of  claim 11 , wherein said step of surrounding further comprises tightly packing said substrate with said boron component or components. 
     
     
         18 . A boronized substrate comprising a majority of titanium, by weight, and a boron coating at least 10 thick,
 wherein said substrate was boronized at a temperature above 800° C. for at least two hours; and   wherein said substrate was placed in a reduced pressure environment with a boron source.   
     
     
         19 . The boronized substrate of  claim 18 , further comprising a characteristic of zero galling at 17,000 psi. 
     
     
         20 . The boronzied substrate of  claim 18 , wherein said boron coating is chemically bound to said substrate.