Photo-curable composition and patterning method

Abstract

A photo-curable composition having a high polymerization rate and a high polymerization conversion is provided. A patterning method having a high throughput is also provided. A photo-curable composition contains a radical-polymerizable monomer (A), a photopolymerization initiator (B), and a compound (C) serving as a sensitizer and having the following general formula (1). X1 and X2 are selected from the group consisting of a hydrogen atom, alkyl groups, a phenyl group, a naphthyl group, and alkyl groups in which part or all of the hydrogen atoms are substituted with fluorine. X1 and X2 may be the same or different. R1 to R10 are independently selected from the group consisting of a hydrogen atom, halogen atoms, alkyl groups, alkoxy groups, a phenyl group, a naphthyl group, and alkyl groups in which part or all of the hydrogen atoms are substituted with fluorine. R1 to R10 may be the same or different.

1 . A photo-curable composition, comprising: a radical-polymerizable monomer (A); a photopolymerization initiator (B); and a compound (C) serving as a sensitizer and having the following general formula (1): 
       
         
           
           
               
               
           
         
         wherein X1 and X2 are independently selected from the group consisting of a hydrogen atom, substituted and unsubstituted alkyl groups, and substituted and unsubstituted aryl groups, R1 to R10 are independently selected from the group consisting of a hydrogen atom, halogen atoms, substituted and unsubstituted alkyl groups, substituted and unsubstituted alkoxy groups, and substituted and unsubstituted aryl groups, and X1 and X2 may be combined together to form a ring. 
       
     
     
         2 . The photo-curable composition according to  claim 1 , wherein the photopolymerization initiator (B) is a photo radical generator. 
     
     
         3 . The photo-curable composition according to  claim 1 , wherein the compound (C) is anisoin N-cyclohexyl carbamate. 
     
     
         4 . The photo-curable composition according to  claim 2 , wherein the photo radical generator is selected from the group consisting of 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1 having the following general formula (3), 2,2-dimethoxy-2-phenylacetophenone having the following general formula (4), and 2-hydroxy-2-methyl-1-phenyl-propan-1-one having the following general formula (5) 
       
         
           
           
               
               
           
         
       
     
     
         5 . A patterning method for forming a pattern of a photo-cured product on a substrate to be processed, comprising:
 placing the photo-curable composition according to  claim 1  on the substrate to be processed;   bringing the photo-curable composition into contact with a mold;   irradiating the photo-curable composition with light to cure the photo-curable composition; and   releasing the photo-cured product from the mold after the irradiation.   
     
     
         6 . A method for manufacturing a circuit board, comprising: etching or implanting ions into a substrate in accordance with a pattern formed by the patterning method according to  claim 5 , thereby forming a circuit structure. 
     
     
         7 . An article, comprising: a substrate; and a cured product disposed on the substrate, the cured product having a pattern of the photo-curable composition according to  claim 1 . 
     
     
         8 . The photo-curable composition according to  claim 2 , wherein the compound (C) is anisoin N-cyclohexyl carbamate. 
     
     
         9 . The method for manufacturing a circuit board according to  claim 6 , wherein the circuit board is a semiconductor device.