Gas barrier film

Abstract

A gas barrier film includes at least one gas barrier layer and a protective layer over a substrate. The protective layer contains organosilicon and is disposed on the gas barrier layer. At least part of the gas barrier layer has a composition SiO x N y where a condition 0.1≦x/(x+y)≦0.9 is satisfied. The protective layer has received a modification treatment, which is irradiation with ultraviolet light having a wavelength of 300 nm or less. A ratio of a density of the protective layer to a density of the gas barrier layer is 0.2 or more and 0.75 or less.

1 . A gas barrier film comprising at least one gas barrier layer and a protective layer over a substrate, the protective layer containing organosilicon and being disposed on the gas barrier layer, wherein
 at least part of the gas barrier layer has a composition SiO x N y  where a condition 0.1≦x/(x+y)≦0.9 is satisfied,   the protective layer has received a modification treatment, which is irradiation with ultraviolet light having a wavelength of 300 nm or less, and   a ratio of a density of the protective layer to a density of the gas barrier layer is 0.2 or more and 0.75 or less.   
     
     
         2 . The gas barrier film according to  claim 1 , wherein the substrate has a thermal expansion rate of 100 ppm/° C. or less and a glass-transition temperature of 120° C. or more. 
     
     
         3 . The gas barrier film according to  claim 1 , wherein the gas barrier layer is formed by performing a modification treatment to a coating film containing polysilazane, the modification treatment being irradiation with ultraviolet light having a wavelength of 400 nm or less. 
     
     
         4 . The gas barrier film according to  claim 1 , wherein the protective layer comprises material containing a siloxane bond. 
     
     
         5 . The gas barrier film according to  claim 1 , wherein, on each side of one of the gas barrier layer and the protective layer, the other of the gas barrier layer and the protective layer is disposed. 
     
     
         6 . The gas barrier film according to  claim 1 , wherein the modification treatment is irradiation with vacuum ultraviolet light having a wavelength of less than 180 nm.