US2014311044A1PendingUtilityA1

Polishing film

Assignee: TAURA TOSHIKAZUPriority: Apr 25, 2011Filed: Apr 18, 2012Published: Oct 23, 2014
Est. expiryApr 25, 2031(~4.7 yrs left)· nominal 20-yr term from priority
B24B 19/226B24D 3/28B24B 37/245B24D 3/346B24D 3/344
39
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

The present invention provides a polishing film with which, even when water containing impurity ions is used as a polishing liquid, the abrasive particles comprising SiO 2 are less apt to adhere to the polished surface, e.g., the polished surface of an end of an optical fiber itself, and which is less apt to cause the optical loss attributable to scratches or edge chips in the polished surface. The polishing film hence renders good finish-polishing quality possible. This polishing film is characterized by comprising a substrate and an abrasive layer which has been disposed on a surface of the substrate and which comprises abrasive particles comprising SiO 2 , a binder resin, and an adhesion inhibitor containing a phosphorus compound.

Claims

exact text as granted — not AI-modified
1 . A polishing film at least comprising: a substrate, and an abrasive layer that is arranged on a surface of the substrate, and that has abrasive particles containing SiO 2 , a binder resin, and an anti-adhesive agent containing a phosphorus compound. 
     
     
         2 . The polishing film according to  claim 1 , wherein the phosphorus compound is a compound comprising a phosphate group and/or a phosphonate group. 
     
     
         3 . The polishing film according to  claim 1 , for a substrate to be polished containing SiO 2 . 
     
     
         4 . The polishing film according to  claim 2 , for a substrate to be polished containing SiO 2 .

Join the waitlist — get patent alerts

Track US2014311044A1 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.