Metal catalyst, method for manufacturing the metal catalyst and electrochemical reduction method
Abstract
This invention relates to a metal catalyst, a manufacturing method of the metal catalyst, and an electrochemical reduction method. The metal catalyst is manufactured by a method comprising providing a conductor to one side of an insulator, providing a fluid including a metal ion and an electron mediator to the other side of the insulator and providing a voltage to the conductor. The electrochemical reduction method comprises providing a conductor to one side of an insulator, providing a fluid including reduction material and an electron mediator to the other side of the insulator and providing a voltage to the conductor.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A metal catalyst manufactured by a method comprising:
providing a conductor to one side of an insulator; providing a fluid including a metal ion and an electron mediator to the other side of the insulator; and providing a voltage to the conductor.
2 . The metal catalyst of claim 1 ,
wherein the metal catalyst comprises a crystal structure with a miller index of (hkl), and at least one of the h, k and l is more than 2.
3 . The metal catalyst of claim 1 ,
wherein the metal catalyst has a polygonal shape.
4 . The metal catalyst of claim 1 ,
wherein the metal catalyst comprises two or more kinds of metals.
5 . The metal catalyst of claim 1 ,
wherein the metal ion comprises one or more chosen from palladium, gold, platinum, copper and cobalt.
6 . The metal catalyst of claim 1 ,
wherein the electron mediator comprises one or more chosen from a hydrogen ion, a hydrogen atom and a hydrogen molecule.
7 . The metal catalyst of claim 1 ,
wherein the fluid comprises a solution or a gas, the solution comprises an aqueous solution or an organic solution, and the gas comprises hydrogen gas.
8 . The metal catalyst of claim 1 ,
wherein the conductor comprises a semiconductor or a metal doped by an n-type dopant or a p-type dopant.
9 . The metal catalyst of claim 1 ,
wherein the insulator is a dielectric layer, and the insulator comprises a semiconductor oxide, a metal oxide, a semiconductor nitride, a metal nitride or a polymer.
10 . The metal catalyst of claim 1 ,
wherein the insulator has a thickness of about 0.5 nm to about 100 μm.
11 . A method for manufacturing a metal catalyst, comprising:
providing a conductor to one side of an insulator; providing a fluid including a metal ion and an electron mediator to the other side of the insulator; and providing a voltage to the conductor.
12 . The method for manufacturing a metal catalyst of claim 12 ,
wherein the insulator comprises a functional group reacting and combining with the metal ion at a surface of the insulator contacting with the solution.
13 . An electrochemical reduction method, comprising:
providing a conductor to one side of an insulator; providing a fluid including reduction material and an electron mediator to the other side of the insulator; and providing a voltage to the conductor.
14 . The electrochemical reduction method of claim 13 ,
wherein the electron mediator moves into the insulator by the voltage and receives electrons from the conductor and provides the electrons to the reduction material.
15 . The electrochemical reduction method of claim 13 ,
wherein the electron mediator comprises one or more chosen from a hydrogen ion, a hydrogen atom and a hydrogen molecule.
16 . The electrochemical reduction method of claim 13 ,
wherein the fluid comprises a solution or a gas, the solution comprises an aqueous solution or an organic solution, and the gas comprises hydrogen gas.
17 . The electrochemical reduction method of claim 16 ,
wherein an electric current flows in the insulator by the voltage, and the size of the electric current is adjusted by a pH of the solution.
18 . The electrochemical reduction method of claim 13 ,
wherein the conductor comprises a semiconductor or a metal doped by an n-type dopant or a p-type dopant.
19 . The electrochemical reduction method of claim 13 ,
wherein the insulator is a dielectric layer, and the insulator comprises a semiconductor oxide, a metal oxide, a semiconductor nitride, a metal nitride or a polymer.
20 . The electrochemical reduction method of claim 13 ,
wherein the insulator has a thickness of about 0.5 nm to about 100 μm.Join the waitlist — get patent alerts
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