Arrangement for actuating an element in a microlithographic projection exposure apparatus

Abstract

The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (n R ) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the-degrees of freedom, and a second number (n A ) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (n A ) is greater than the first number (n R ). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.

1 .- 20 . (canceled) 
     
     
         21 . An arrangement, comprising:
 an optical element configured so that an adjustable force is transmittable to the optical element in a first number of degrees of freedom; and   a second number of sensor elements configured to determine a parameter,   wherein:
 the parameter comprises at least one member selected from the group consisting of a location of the optical element along the first number of degrees of freedom and a position of the optical element along the first number of degrees of freedom; and 
 the second number is greater than the first number. 
   
     
     
         22 . The arrangement of  claim 21 , wherein the optical element comprises a mirror. 
     
     
         23 . The arrangement of  claim 21 , wherein the optical element comprises an actively deformable mirror. 
     
     
         24 . The arrangement of  claim 23 , wherein the actively deformable mirror is configured to compensate an undesirable disturbance in the projection exposure apparatus. 
     
     
         25 . The arrangement of  claim 21 , wherein the optical element comprises a non-actively deformable mirror. 
     
     
         26 . The arrangement of  claim 21 , further comprising a plurality of actuators, wherein each actuator is coupled to the optical element via a mechanical coupling to transmit a force to the optical element. 
     
     
         27 . The arrangement of  claim 26 , wherein at least one of the actuators is arranged at a node of at least one natural vibration mode of the optical element. 
     
     
         28 . The arrangement of  claim 26 , wherein the actuators are configured so that actuation in the degrees of freedom is substantially orthogonal to at least one natural vibration mode of the optical element. 
     
     
         29 . The arrangement of  claim 26 , wherein at least one of the actuators comprises a Lorentz actuator. 
     
     
         30 . The arrangement of  claim 21 , further comprising a third number of actuators, wherein each actuator is coupled to the optical element via a mechanical coupling to transmit a force to the optical element, and third number is greater than the first number. 
     
     
         31 . The arrangement of  claim 21 , wherein the first number is at least three. 
     
     
         32 . The arrangement of  claim 21 , wherein the first number is six. 
     
     
         33 . The arrangement of  claim 21 , wherein the arrangement is configured to be used in a microlithographic projection exposure apparatus. 
     
     
         34 . The arrangement of  claim 21 , wherein the arrangement is configured to be used in an EUV microlithographic projection exposure apparatus. 
     
     
         35 . An apparatus, comprising:
 an arrangement, comprising:
 an optical element configured so that an adjustable force is transmittable to the optical element in a first number of degrees of freedom; and 
 a second number of sensor elements configured to determine a parameter, 
   wherein:
 the parameter comprises at least one member selected from the group consisting of a location of the optical element along the first number of degrees of freedom and a position of the optical element along the first number of degrees of freedom; 
 the second number is greater than the first number; and 
 the apparatus is a microlithographic projection exposure apparatus. 
   
     
     
         36 . The apparatus of  claim 35 , wherein the microlithographic projection exposure apparatus is an EUV microlithographic projection exposure apparatus. 
     
     
         37 . A method, comprising:
 transmitting a controllable force to an optical element in a first number of degrees of freedom, the optical element being a component of a microlithographic projection exposure apparatus; and   using a second number of sensor elements to determine: a) a location of the optical element along the first number of degrees of freedom; and/or b) a position of the optical element along the first number of degrees of freedom,   wherein the second number is greater than the first number.   
     
     
         38 . The method of  claim 37 , wherein the optical element comprises a mirror. 
     
     
         39 . The method of  claim 37 , wherein the optical element comprises a mirror, and the method further comprises using adjustable forces to actively deform the mirror. 
     
     
         40 . The method of  claim 37 , wherein the optical element comprises a mirror, and the method further comprises using adjustable forces to position the mirror. 
     
     
         41 . The method of  claim 37 , further comprising:
 determining an imaging aberration in the projection exposure apparatus; and   positioning the optical element to at least partly compensate for the imaging aberration and/or actively deforming the optical element to at least partly compensate for the imaging aberration.   
     
     
         42 . The method of  claim 37 , further comprising using actuators to transmit the controllable force to the optical element. 
     
     
         43 . The method of  claim 22 , wherein at least one of the actuators is arranged at a node of at least one natural vibration mode of the optical element. 
     
     
         44 . The method of  claim 23 , wherein the actuators are configured so that actuation in the degrees of freedom is substantially orthogonal to at least one natural vibration mode of the optical element. 
     
     
         45 . The method of  claim 37 , further comprising using a third number actuators to transmit the controllable force to the optical element, wherein the third number is greater than the first number.