US2014284306A1PendingUtilityA1

Method for manufacturing porous structure and method for forming pattern

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Assignee: TOSHIBA KKPriority: Jun 7, 1999Filed: Jun 4, 2014Published: Sep 25, 2014
Est. expiryJun 7, 2019(expired)· nominal 20-yr term from priority
Inventors:Koji AsakawaToshiro HiraokaYoshihiro AkasakaYasuyuki Hotta
H10P 76/4085H10P 14/6922H10P 14/6686H10P 14/6682H10P 14/6538H10P 14/6529H10P 14/6342H10P 14/683H10P 14/665H01M 4/96G11B 5/743H01M 8/0234H01J 9/02G11B 5/74C08J 2333/12C03C 2217/425H01G 11/30Y10S438/945H01J 9/025C03C 2217/479C08J 2383/16H01M 8/026G11B 5/855G11B 2005/0029H01G 11/56B82Y 30/00C03C 17/007C03C 2218/33C08J 9/26H01M 8/0245Y10S438/947Y10T428/24149H01M 4/8605H01M 10/0525G03F 7/0002H01M 8/1011H01M 4/133C23F 1/30H01M 4/131Y10S977/90H01M 50/414H01M 50/406B82Y 10/00Y02E60/10Y02P70/50Y02E60/13Y02E60/50
61
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Claims

Abstract

A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.

Claims

exact text as granted — not AI-modified
1 . A method for manufacturing a porous structure comprising:
 forming a molded product made of a pattern forming material;   forming a structure having micro polymer phases in the molded product; and   forming a porous structure by dry-etching the molded product to selectively remove a polymer phase from the structure having micro polymer phases;   wherein the pattern forming material comprises a copolymer selected from the group consisting of:   a block copolymer and a graft copolymer, each comprising two polymer chains whose ratio between N/(Nc−NO) values of respective monomer units is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit; and   a block copolymer and a graft copolymer, each comprising a polysilane chain and a carbon-based organic polymer chain.   
     
     
         2 - 40 . (canceled)

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