US2014262801A1PendingUtilityA1
Method of filling through-holes
Est. expiryMar 14, 2033(~6.6 yrs left)· nominal 20-yr term from priority
H05K 3/423C25D 3/38C25D 5/02C25D 5/34C23C 18/1653C25D 5/10
45
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Claims
Abstract
The methods inhibit or reduce dimpling and voids during copper electroplating of through-holes with flash copper layers in substrates such as printed circuit boards. An acid solution containing disulfide compounds is applied to the through-holes of the substrate followed by filling the through-holes with copper using an acid copper electroplating bath which includes additives such as brighteners and levelers.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method comprising:
a) providing a substrate with a plurality of through-holes and a layer of copper flash on a surface of the substrate and walls of the plurality of through-holes; b) applying an aqueous acid solution to at least the plurality of through-holes, the aqueous acid solution comprising one or more disulfide compounds having a formula:
wherein X is sodium, potassium or hydrogen, R is independently hydrogen or an alkyl, n and m are integers of 1 or greater, the one or more disulfide compounds are in amounts of 50 ppb to 10 ppm; and
c) electroplating at least the through-holes with copper using an acid copper electroplating bath comprising one or more brighteners and one or more levelers.
2 . The method of claim 1 , wherein the disulfide compounds are in amounts of 50 ppb to 500 ppb.
3 . The method of claim 1 , wherein X is sodium or hydrogen.
4 . The method of claim 1 , wherein R is independently hydrogen or (C 1 -C 6 )alkyl.
5 . The method of claim 1 , wherein m and n are independently integers of 1-6.
6 . The method of claim 1 , wherein the disulfide compound is bis(3-sulfopropyl)disulfide.
7 . The method of claim 1 , wherein the one or more levelers of the copper electroplating bath are reaction products of one or more imidazole compounds and one or more epoxy compounds.Join the waitlist — get patent alerts
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