US2014245609A1PendingUtilityA1

Method of manufacturing regenerative refrigerator

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Assignee: SUMITOMO HEAVY INDUSTRIESPriority: Apr 23, 2009Filed: May 13, 2014Published: Sep 4, 2014
Est. expiryApr 23, 2029(~2.7 yrs left)· nominal 20-yr term from priority
Inventors:Masayuki IshizukaYuichi TateishiMingyao XuKyosuke Nakano
F25B 9/14F25B 2309/006Y10T29/49359
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Claims

Abstract

A method of manufacturing a regenerative refrigerator including a rotary valve configured to switch passages of helium gas, the rotary valve including a valve body and a valve plate, includes forming the valve body of a first material and forming the valve plate of a second material, wherein the first material is one of a resin and an aluminum metal or an aluminum alloy and the second material is the other of the resin and the aluminum metal or the aluminum alloy, anodizing a surface of one of the valve body and the valve plate which is formed of the aluminum metal or the aluminum alloy, polishing the anodized surface, and performing shot peening on the polished anodized surface so that the polished anodized surface has an arithmetic average roughness of 0.2 μm to 0.9 μm.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A method of manufacturing a regenerative refrigerator including a rotary valve configured to switch passages of helium gas, the rotary valve including a valve body and a valve plate, the method comprising:
 forming the valve body of a first material and forming the valve plate of a second material, wherein the first material is one of a resin and an aluminum metal or an aluminum alloy and the second material is the other of the resin and the aluminum metal or the aluminum alloy;   anodizing a surface of one of the valve body and the valve plate which is formed of the aluminum metal or the aluminum alloy;   polishing the anodized surface; and   performing shot peening on the polished anodized surface so that the polished anodized surface has an arithmetic average roughness of 0.2 μto 0.9 μm.   
     
     
         2 . The method as claimed in  claim 1 , wherein ceramic particles of approximately 1 μm to approximately 200 μm in average particle size are used in said shot peening. 
     
     
         3 . The method as claimed in  claim 1 , wherein ceramic particles of approximately 30 μm to approximate 50 μm in average particle size are used in said shot peening. 
     
     
         4 . The method as claimed in  claim 1 , further comprising:
 providing a carbon film on the polished anodized surface after said shot peening.

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