Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, manufacturing method of electronic device, and electronic device

Abstract

A pattern forming method including: a process of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin including a Repeating Unit (a1) having a group capable of being decomposed by acid and generating a carboxyl group, and a compound capable of generating acid through irradiation of actinic rays or radiation; a process of exposing the film; and a process of developing the exposed film using a developer including an organic solvent to form a negative tone pattern, wherein the value X obtained by substituting the number of each atom included in the Repeating Unit (a1) after being decomposed by acid and generating a carboxyl group in the following formula is 0<X≦5. X =(total number of atoms configuring repeating unit after being decomposed by acid)/[(number of carbon atoms)−(number of atoms that are neither carbon atoms nor hydrogen atoms)]

What is claimed is: 
     
         1 . A pattern forming method comprising:
 (i) a process of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a Resin (P) including a Repeating Unit (a1) having a group capable of being decomposed by acid and generating a carboxyl group, and a Compound (B) capable of generating acid through irradiation of actinic rays or radiation;   (ii) a process of exposing the film using actinic rays or radiation; and   (iii) a process of developing the exposed film using a developer including an organic solvent containing a hetero atom and carbon atoms having 7 or more carbon atoms to form a negative tone pattern,   wherein a value X obtained by substituting a number of each atom included in the Repeating Unit (a1) after being decomposed by acid and generating a carboxyl group in the following general formula is 0<X≦5,
     X =(total number of atoms configuring repeating unit after being decomposed by acid)/[(number of carbon atoms)−(number of atoms that are neither carbon atoms nor hydrogen atoms)].
 
   
     
     
         2 . The pattern forming method according to  claim 1 ,
 wherein the Repeating Unit (a1) has a structure represented by a following General Formula (I) or (II):   
       
         
           
           
               
               
           
         
         in General Formulae (I) and (II), 
         X 1  represents a polymerized unit configuring a polymer main chain, 
         X 2  represents a polymerized unit configuring the polymer main chain and having an alicyclic skeleton, 
         Ry 1  to Ry 3  respectively independently represent an alkyl group or a cycloalkyl group. Two out of Ry 1  to Ry 3  may be linked to form a ring, 
         Z represents an n+1 value linking group having a polycyclic hydrocarbon structure that may include hetero atoms as ring members, and does not contain ester bonds as an atomic group configuring a polycycle, 
         L 1 , L 2 , and L 3  respectively independently represent a single-bond or a divalent linking group, 
         n represents an integer from 1 to 3, and when n is 2 or 3, a plurality of L 2 's, a plurality of Ry 1 's, a plurality of Ry 2 's, and a plurality of Ry 3 's may each be a same or different from one another. 
       
     
     
         3 . The pattern forming method according to  claim 1 ,
 wherein the Repeating Unit (a1) is a structure represented by the following General Formula (III):   
       
         
           
           
               
               
           
         
         in the formula, Xa represents a hydrogen atom, an alkyl group, a cyano group, or a halogen atom, 
         Ry 1  to Ry 3  respectively independently represent an alkyl group or a cycloalkyl group. Two out of Ry 1  to Ry 3  may be linked to form a ring, 
         Z represents an n+1 value linking group having a polycyclic hydrocarbon structure that may include hetero atoms as ring members. Here, Z does not contain ester bonds as an atomic group configuring a polycycle, 
         L 11  and L 2  respectively independently represent a single-bond or a divalent linking group, 
         n represents an integer from 1 to 3, and when n is 2 or 3, the plurality of L 2 's, the plurality of Ry 1 's, the plurality of Ry 2 's, and the plurality of Ry 3 's may each be the same or different from one another. 
       
     
     
         4 . The pattern forming method according to  claim 1 ,
 wherein the Resin (P) contains equal to or greater than 80 mol % of the Repeating Unit (a1).   
     
     
         5 . The pattern forming method according to  claim 1 ,
 wherein all repeating units contained in the Resin (P) include a group capable of being decomposed by acid.   
     
     
         6 . The pattern forming method according to  claim 1 ,
 wherein the Compound (B) is a compound capable of generating an organic acid represented by the following General Formula (IV) or (V) through irradiation of actinic rays or radiation:   
       
         
           
           
               
               
           
         
         in General Formulae (IV) and (V), 
         Xf respectively independently represents a fluorine atom or an alkyl group substituted by at least one fluorine atom, 
         R 1  and R 2  respectively independently represent a hydrogen atom, a fluorine atom, or an alkyl group. In a case where y≧2, each of R 1  and R 2  may be the same or different from one another, 
         L respectively independently represents a divalent linking group, and in a case where z≧2, each L may be the same or different from one another, 
         Cy represents a cyclic organic group, 
         Rf is a group including a fluorine atom, 
         x represents an integer from 1 to 20, 
         y represents an integer from 0 to 10, 
         z represents an integer from 0 to 10. 
       
     
     
         7 . The pattern forming method according to  claim 1 ,
 wherein the actinic ray-sensitive or radiation-sensitive resin composition further contains a basic compound in which basicity decreases through the irradiation of actinic rays or radiation or an ammonium salt compound in which the basicity decreases through the irradiation of actinic rays or radiation.   
     
     
         8 . The pattern forming method according to  claim 1 ,
 wherein the actinic ray-sensitive or radiation-sensitive resin composition further includes a hydrophobic resin containing at least either of a fluorine atom or a silicon atom.   
     
     
         9 . The pattern forming method according to  claim 1 ,
 wherein the exposure in the process (ii) is immersion exposure.   
     
     
         10 . The pattern forming method according to  claim 1 ,
 wherein the water content of the developer is less than 10% by mass.   
     
     
         11 . An actinic ray-sensitive or radiation-sensitive resin composition used for the pattern forming method according to  claim 1  comprising:
 a Resin (P) including a Repeating Unit (a1) having a group capable of being decomposed by acid and generating a carboxyl group; and 
 a Compound (B) capable of generating acid through irradiation of actinic rays or radiation, 
 wherein the value X obtained by substituting the number of each atom included in the Repeating Unit (a1) after being decomposed by acid and generating a carboxyl group in the following general formula is 0<X≦5,
     X =(total number of atoms configuring repeating unit after being decomposed by acid)/[(number of carbon atoms)−(number of atoms that are neither carbon atoms nor hydrogen atoms)].
 
 
 
     
     
         12 . An actinic ray-sensitive or radiation-sensitive film formed using the actinic ray-sensitive or radiation-sensitive resin composition according to  claim 11 . 
     
     
         13 . A manufacturing method of an electronic device including the pattern forming method according to  claim 1 . 
     
     
         14 . An electronic device manufactured by the manufacturing method of the electronic device according to  claim 13 .