Methods and Systems for Site-Isolated Combinatorial Substrate Processing Using a Mask

Abstract

Embodiments provided herein describe methods and systems for processing substrates. A substrate processing tool includes a housing having a sidewall and a lid. The housing defines a processing chamber. A substrate support is configured to support a substrate within the processing chamber. A plasma generation source is coupled to the housing and in fluid communication with the processing chamber through the lid of the housing. The plasma generation source is configured to provide a plasma activated species into the processing chamber. A mask is positioned within the processing chamber to at least partially shield the substrate from the plasma activated species. The mask includes a plurality of openings configured such that when the mask is in first and second positions, the plasma activated species passes through a respective first and second of the plurality of openings and causes first and second regions on the substrate to be processed.

What is claimed: 
     
         1 . A substrate processing tool comprising:
 a housing comprising a sidewall and a lid, the housing defining a processing chamber;   a substrate support coupled to the housing and configured to support a substrate within the processing chamber;   a plasma generation source coupled to the housing and in fluid communication with the processing chamber through the lid of the housing, the plasma generation source being configured to provide a plasma activated species into the processing chamber; and   a first mask moveably coupled to the housing and positioned within the processing chamber to at least partially shield the substrate from the plasma activated species, the first mask comprising a plurality of openings configured such that when the first mask is in a first position, the plasma activated species passes through a first of the plurality of openings and causes a first region on the substrate to be processed, and when the first mask is in a second position, the plasma activated species passes through a second of the plurality of openings and causes a second region on the substrate to be processed.   
     
     
         2 . The substrate processing tool of  claim 1 , wherein the first mask is rotatably coupled to the housing. 
     
     
         3 . The substrate processing tool of  claim 2 , wherein the first mask is moveable between the substrate support and the lid of the housing. 
     
     
         4 . The substrate processing tool of  claim 1 , further comprising a second mask moveable coupled to the housing and at least partially positioned between the first mask and the substrate support, the second mask comprising at least one opening. 
     
     
         5 . The substrate processing tool of  claim 4 , wherein the plurality of openings on the first mask and the at least one opening on the second mask are configured such that when the first mask and the second mask are each in a first position, the plasma activated species passes though the first mask and the second mask and causes the first region on the substrate to be processed, and when the first mask and the second mask are each in a second position, the plasma activated species passes though the first mask and the second mask and causes the second region on the substrate to be processed. 
     
     
         6 . The substrate processing tool of  claim 1 , wherein when the first mask is in the first position, the first of the plurality of openings is positioned directly above the first region on the substrate, and when the first mask is in a second position, the second of the plurality of openings is positioned directly above the second of the plurality of regions. 
     
     
         7 . The substrate processing tool of  claim 2 , wherein the first mask is rotatable about an axis that is not congruent to a central axis of the substrate. 
     
     
         8 . The substrate processing tool of  claim 7 , wherein the axis about which the first mask is rotatable is substantially parallel to the central axis of the substrate. 
     
     
         9 . The substrate processing tool of  claim 1 , wherein the housing does not include a showerhead positioned between the plasma generation source and the substrate. 
     
     
         10 . The substrate processing tool of  claim 1 , wherein the plasma activated species is one of hydrogen, nitrogen, argon, oxygen, ammonia, nitrogen trifluoride, helium, or a combination thereof. 
     
     
         11 . A substrate processing tool comprising:
 a housing comprising a sidewall and a lid, the housing defining a processing chamber;   a substrate support coupled to the housing and configured to support a substrate within the processing chamber;   a plasma generation source coupled to the housing and in fluid communication with the processing chamber through the lid of the housing, the plasma generation source being configured to provide a plasma activated species into the processing chamber; and   a first mask rotatably coupled to the housing and positioned within the processing chamber to at least partially shield the substrate from the plasma activated species, the first mask comprising a plurality of openings configured such that when the first mask is rotated to a first position, a first of the plurality of openings is positioned directly between the plasma generation source and a first of the plurality of regions on the substrate such that the plasma activated species passes through the first of the plurality of openings and causes the first region on the substrate to be processed, and when the first mask is rotated to a second position, a second of the plurality of openings is positioned directly between the plasma generation source and a second of the plurality of regions on the substrate such that the plasma activated species passes through the second of the plurality of openings and causes the second region on the substrate to be processed.   
     
     
         12 . The substrate processing tool of  claim 11 , further comprising a second mask rotatably coupled to the housing and at least partially positioned between the first mask and the substrate support, the second mask comprising a plurality of openings. 
     
     
         13 . The substrate processing tool of  claim 12 , wherein the plurality of openings on the first mask and the plurality of openings on the second mask are configured such that when the first mask and the second mask are each rotated to a first position, the plasma activated species passes though the first mask and the second mask and causes the first region on the substrate to be processed, and when the first mask and the second mask are each in a second position, the plasma activated species passes though the first mask and the second mask and causes the second region on the substrate to be processed. 
     
     
         14 . The substrate processing tool of  claim 11 , wherein the first mask is rotatable about an axis that is substantially parallel to a central axis of the substrate. 
     
     
         15 . The substrate processing tool of  claim 14 , wherein the first mask is rotatable about an axis that is not congruent with a central axis of the substrate. 
     
     
         16 . A method for processing a substrate, the method comprising:
 providing a substrate having a plurality of regions thereon;   generating a plasma activated species;   causing the plasma activated species to flow towards the substrate;   providing a first mask in a first position such that the first mask at least partially shields the substrate from the plasma activated species, wherein when the first mask is in the first position, the plasma activated species passes through a first of the plurality of openings and causes a first region on the substrate to be processed; and   moving the first mask into a second position such that the first mask at least partially shields the substrate from the plasma activated species, wherein when the first mask is in the second position, the plasma activated species passes through a second of the plurality of openings and causes a second region on the substrate to be processed.   
     
     
         17 . The method of  claim 16 , wherein the substrate and the first mask are positioned within a processing chamber and the moving of the first mask into the second position comprises rotating the first mask within the processing chamber. 
     
     
         18 . The method of  claim 17 , wherein the processing chamber is defined by a housing having a lid, and further comprising moving the first mask between the substrate support and the lid of the housing. 
     
     
         19 . The method of  claim 17 , wherein the rotating of the first mask within the processing chamber comprises rotating the first mask about an axis that is not congruent with a central axis of the substrate. 
     
     
         20 . The method of  claim 19 , wherein the axis about which the first mask is rotated is substantially parallel to the central axis of the substrate.