Multi-functional apparatus for testing and etching substrate and substrate processing apparatus including the same
Abstract
A multi-functional apparatus for testing and etching a substrate capable of increasing spatial efficiency and manufacturing efficiency by performing testing and etching operations in a same chamber body and a substrate processing apparatus including the same, the multi-functional apparatus including a chamber body having an entrance into which the substrate is injected in one of its sides and an exit from which the substrate is ejected in another one of its sides; a transfer unit disposed inside of the chamber body and for transferring the injected substrate in a direction from the entrance to the exit; a laser etching unit disposed on an upper portion of the transfer unit and for etching a part of the substrate disposed on the transfer unit; and a testing unit for testing the substrate disposed on the transfer unit.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A multi-functional apparatus for testing and etching a substrate, the multi-functional apparatus comprising:
a chamber body having an entrance in one of its sides and an exit in another one of its sides, the substrate being injected into the chamber body through the entrance and being ejected from the chamber body through the exit; a transfer unit disposed inside of the chamber body and configured to transfer the injected substrate in a direction from the entrance to the exit; a laser etching unit disposed above the transfer unit and configured to etch a part of the substrate disposed on the transfer unit; and a testing unit configured to test the substrate disposed on the transfer unit.
2 . The multi-functional apparatus of claim 1 , wherein the testing unit is disposed under the transfer unit.
3 . The multi-functional apparatus of claim 2 , wherein the chamber body has a lower opening in a lower portion thereof.
4 . The multi-functional apparatus of claim 3 , further comprising an up-down unit for moving the testing unit up and down,
wherein the testing unit is configured to be moved up by the up-down unit to be disposed adjacent to the lower opening of the chamber body, and to test the substrate.
5 . The multi-functional apparatus of claim 4 , wherein, when the testing unit is moved up by the up-down unit, the testing unit shields the lower opening of the chamber body.
6 . The multi-functional apparatus of claim 3 , further comprising an up-down unit for moving the testing unit up and down through the lower opening in such a manner that the testing unit is disposed inside or outside of the chamber body.
7 . The multi-functional apparatus of claim 6 , wherein the testing unit is configured to be moved up by the up-down unit to be disposed inside of the chamber body, and to test the substrate.
8 . The multi-functional apparatus of claim 1 , wherein the testing unit comprises a plate in which a plurality of holes are formed and testing devices engaged into at least a part of the plurality of holes.
9 . The multi-functional apparatus of claim 8 , wherein the testing devices are detachably engaged into at least a part of the plurality of holes.
10 . The multi-functional apparatus of claim 1 , further comprising a rotation unit for rotating the substrate disposed on the transfer unit to face a side surface of the chamber body,
wherein the testing unit is disposed next to the transfer unit and configured to test the rotated substrate.
11 . The multi-functional apparatus of claim 1 , wherein the laser etching unit comprises:
a laser beam irradiation unit for irradiating a laser beam onto the substrate; a first conveyer unit for conveying the laser beam irradiation unit in the direction from the entrance to the exit or in an opposite direction to the direction; and a second conveyer unit for conveying the laser beam irradiation unit in a direction crossing the direction from the entrance to the exit.
12 . The multi-functional apparatus of claim 11 , wherein one of the first conveyer unit and the second conveyer unit is configured to be conveyed by the other one of the first conveyer unit and the second convey unit, along with the laser beam irradiation unit.
13 . The multi-functional apparatus of claim 1 , wherein the laser etching unit comprises:
a laser beam irradiation unit for irradiating a laser beam onto the substrate; a guiding unit configured to guide the laser beam ejected from the laser beam irradiation unit onto the substrate; a first conveyer unit for conveying the guiding unit in the direction from the entrance to the exit or in an opposite direction to the direction; and a second conveyer unit for conveying the guiding unit in a direction crossing the direction from the entrance to the exit.
14 . The multi-functional apparatus of claim 13 , wherein one of the first conveyer unit and the second conveyer unit is configured to be conveyed by the other on of the first conveyer unit and the second conveyer unit, along with the guiding unit.
15 . The multi-functional apparatus of claim 13 , wherein a relative location of the laser beam irradiation unit with respect to the chamber body is fixed.
16 . The multi-functional apparatus of claim 11 , further comprising an etching unit support unit configured to support the laser etching unit from the outside of the chamber body,
wherein the chamber body has an upper opening formed in an upper portion thereof and comprises a transmission window that shields the upper opening, and wherein the laser beam irradiation unit is configured to irradiate the laser beam onto the substrate through the transmission window.
17 . The multi-functional apparatus of claim 16 , wherein the etching unit support unit is configured not to contact the chamber body.
18 . The multi-functional apparatus of claim 1 , wherein the inside of the chamber body is maintained in a nitrogen atmosphere.
19 . The multi-functional apparatus of claim 1 , wherein the multi-functional apparatus for testing and etching the substrate is configured to manufacture a bottom emission display apparatus.
20 . The multi-functional apparatus of claim 19 , wherein the transfer unit is configured to contact and transfer the substrate through which light is to pass, and the substrate is an element of the bottom emission display apparatus.
21 . A substrate processing apparatus comprising:
a first process chamber; a second process chamber; and the multi-functional apparatus for testing and etching the substrate of claim 1 disposed between the first process chamber and the second process chamber.
22 . The substrate processing apparatus of claim 21 , further comprising:
a first chamber support unit for supporting the first process chamber; and a second chamber support unit for supporting the second process chamber, wherein the multi-functional apparatus for testing and etching the substrate is supported by the first chamber support unit and the second chamber support unit.
23 . The substrate processing apparatus of claim 21 , wherein the first process chamber is a deposition chamber or a plasma etching chamber.
24 . The substrate processing apparatus of claim 21 , wherein the second process chamber is an encapsulation chamber.
25 . The substrate processing apparatus of claim 21 , wherein the substrate processing apparatus is configured to manufacture a bottom emission display apparatus.
26 . The substrate processing apparatus of claim 21 , wherein the transfer unit of the multi-functional apparatus for testing and etching the substrate is configured to contact and transfer the substrate through which light is to pass, and the substrate is an element of the bottom emission display apparatus.Join the waitlist — get patent alerts
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