US2014157813A1PendingUtilityA1

Temperature control system

Assignee: KATO YUZURUPriority: Aug 5, 2011Filed: Aug 2, 2012Published: Jun 12, 2014
Est. expiryAug 5, 2031(~5 yrs left)· nominal 20-yr term from priority
F22B 35/00F28B 9/02B01J 8/22F25D 1/02F28B 11/00B01J 2219/00238B01J 2208/00115B01J 8/001B01J 2219/00211F25D 7/00C10G 2/32B01J 2219/002B01J 2208/00061F28B 9/04
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Claims

Abstract

A temperature control system of the invention recovers reaction heat in a reactor in which an exothermal reaction occurs, to control the temperature in the reactor. The temperature control system includes: a refrigerant drum in which vapor and a liquid refrigerant are stored in a vapor-liquid equilibrium state; a heat removing section arranged in the reactor to evaporate a part of the liquid refrigerant supplied from the refrigerant drum by the reaction heat; a Return line that returns mixed phase fluid of vapor and the liquid refrigerant generated in the heat removing section to the refrigerant drum; a Vapor outlet line that supplies vapor in the refrigerant drum to outside of the system; and a Replenishing line that supplies makeup water in an amount matched with an amount of vapor discharged to the outside of the system, to the Return line.

Claims

exact text as granted — not AI-modified
1 . A temperature control system that recovers reaction heat in a reactor in which an exothermal reaction occurs, to control the temperature in the reactor, comprising:
 a refrigerant drum in which vapor and a liquid refrigerant are stored in a vapor-liquid equilibrium state;   a heat removing section arranged in the reactor to evaporate a part of said liquid refrigerant supplied from said refrigerant drum by said reaction heat;   a Return line that returns mixed phase fluid of vapor and the liquid refrigerant generated in the heat removing section to said refrigerant drum;   a Vapor outlet line that supplies vapor in said refrigerant drum to outside of the system; and   a Replenishing line that supplies makeup water in an amount matched with an amount of vapor discharged to the outside of the system, to said Return line.   
     
     
         2 . A temperature control system according to  claim 1 , further comprising:
 a control unit that determines said amount of makeup water by dividing the reaction heat in said reactor by a unit refrigerant heat amount determined based on a comparatively high temperature in said refrigerant drum, a comparatively low temperature of makeup water, and physical values (specific heat, evaporative latent heat) of the refrigerant; and   a makeup water adjusting device that sets the amount of makeup water to be supplied from said Replenishing line to the Return line according to said amount of makeup water determined by said control unit.   
     
     
         3 . A temperature control system according to  claim 2 , wherein the amount of makeup water determined by said control unit is calculated according to the following equation:
     WL 3 =Q/{Cp ×( t 1 −t 3)+ r} 
   where WL3: amount of makeup water   Q: reaction heat in reactor   Cp: specific heat of liquid refrigerant   t1: temperature in refrigerant drum and heat removing section of reactor   t3: temperature of makeup water   r: evaporative latent heat of liquid refrigerant.   
     
     
         4 . A temperature control system according to  claim 1 , wherein said Replenishing line is connected to said Return line at an acute angle along a traveling direction of mixed phase fluid in said Return line at a junction of said Return line and said Replenishing line. 
     
     
         5 . A temperature control system according to  claim 1 , wherein said Replenishing line is provided with a seal portion that prevents back flow of vapor. 
     
     
         6 . A temperature control system according to  claim 1 , wherein a spray nozzle that sprays makeup water into said Return line is provided in said Replenishing line at the junction of said Return line and said Replenishing line.

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