Pattern transferring apparatus and pattern transferring method
Abstract
A pattern transferring apparatus is disclosed which can prevent damage to a transferred pattern and realize fast mold release regardless of the type of resist. The pattern transferring apparatus transfers a pattern formed on a mold to an object by bringing the mold into contact with the apparatus has a deformer which causes deformation in the mold for releasing the mold from the object. The apparatus transfers a pattern formed on a mold to a photo-curing resin by bringing the mold into contact with the photo-curing resin and applying light thereto to cure the photo-curing resin. The apparatus has an optical system which applies light at an irradiation light intensity to a non-transfer area other than a transfer area where the pattern is to be transferred in the photo-curing resin, the intensity being different from an irradiation light intensity of light applied to the transfer area.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . An imprint apparatus for molding an uncured object on a substrate with a mold that has a pattern area and curing the molded uncured object to form a pattern of the cured object on the substrate, the apparatus comprising:
a substrate stage configured to hold the substrate; a mold stage configured to hold the mold and configured to cause a release of the mold from the cured object to start in an area of the mold adjacent to the pattern area; a driving mechanism configured to cause relative movement between the substrate stage and the mold stage in a direction in which the mold is caused to contact with the uncured object and in a direction in which the mold is released from the cured object; and a controller configured to control the mold stage such that after or in parallel with the curing, the mold stage causes the release to start in the area of the mold adjacent to the pattern area, and to control the driving mechanism such that after the start of the release, the driving mechanism causes the relative movement so that a subsequent release of the mold is performed for the pattern area.
2 . The imprint apparatus according to claim 1 , wherein the mold stage is configured to cause the release to start by irradiating the area of the mold adjacent to the pattern area with infrared light.
3 . The imprint apparatus according to claim 2 , wherein the mold stage is configured to cause the release to start by heating the area of the mold adjacent to the pattern area.
4 . The imprint apparatus according to claim 3 , wherein the mold stage is configured to heat the area of the mold adjacent to the pattern area with a heater provided with the mold.
5 . The imprint apparatus according to claim 1 , wherein the mold stage is configured to cause the release to start by irradiating the area of the mold adjacent to the pattern area with ultraviolet light.
6 . The imprint apparatus according to claim 5 , wherein the mold stage is configured to irradiate the area of the mold adjacent to the pattern area with ultraviolet light in parallel with the curing.
7 . The imprint apparatus according to claim 5 , further comprising a ultraviolet light source for curing the molded uncured object.
8 . The imprint apparatus according to claim 1 , wherein the non-transfer area is on a scribe line.
9 . The imprint apparatus according to claim 1 , wherein the mold stage is configured to cause the release to start in the area of the mold, above a scribe line area of the substrate, adjacent to the pattern area.
10 . The imprint apparatus according to claim 1 , wherein the mold stage is configured to cause the release to start with an actuator provided with the mold.
11 . The imprint apparatus according to claim 10 , wherein the mold stage is configured to cause the release to start by deforming the mold by the actuator.
12 . An imprint method of molding an uncured object on a substrate with a mold that has a pattern area and curing the molded uncured object to form a pattern of the cured object on the substrate, the method comprising:
after or in parallel with the curing, causing a release of the mold from the cured object to start in an area of the mold adjacent to the pattern area; and after the start of the release, causing relative movement between the substrate and the mold so that a subsequent release of the mold is performed for the pattern area.Join the waitlist — get patent alerts
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