Template structures including ultraviolet wavelength radiation transparent material

Abstract

A method of forming a template for use in imprint lithography. The method comprises providing an ultraviolet (“UV”) wavelength radiation transparent layer and forming a pattern in the UV transparent layer by photolithography. The pattern may be formed by anisotropically etching the UV transparent layer and may have feature dimensions of less than approximately 100 nm, such as dimensions of less than approximately 45 nm. An additional embodiment of the method comprises providing a UV opaque layer comprising a first pattern therein, forming a first UV transparent layer in contact with the first pattern of the UV opaque layer, forming a second UV transparent layer in contact with the first UV transparent layer, and removing the UV opaque layer to form the template. An intermediate template structure for use in imprint lithography is also disclosed. In other embodiments, a template that is opaque to UV wavelength radiation and a method of forming the same are disclosed.

What is claimed is: 
     
         1 . A template structure, comprising:
 a first ultraviolet wavelength radiation transparent material having a planar surface opposing a patterned surface comprising recesses and protrusions;   a second ultraviolet wavelength radiation transparent material overlying the planar surface of the first ultraviolet radiation transparent material; and   an adhesive material bonding the first ultraviolet wavelength radiation transparent material to the second ultraviolet wavelength radiation transparent material, the adhesive material having an index of refraction substantially similar to respective indices of refraction of each of the first ultraviolet wavelength radiation transparent material and the second ultraviolet wavelength radiation transparent material.   
     
     
         2 . The template structure of  claim 1 , wherein the protrusions of the first ultraviolet wavelength radiation transparent material each have a feature dimension of less than approximately 100 nanometers. 
     
     
         3 . The template structure of  claim 1 , further comprising at least one alignment mark on the first ultraviolet wavelength radiation transparent material. 
     
     
         4 . The template structure of  claim 1 , further comprising an optically opaque material in contact with at least one of a periphery of the first ultraviolet wavelength radiation transparent material and scribe areas of the first ultraviolet wavelength radiation transparent material. 
     
     
         5 . The template structure of  claim 4 , wherein the optically opaque material is located only on the periphery of the first ultraviolet wavelength radiation transparent material. 
     
     
         6 . The template structure of  claim 4 , wherein the optically opaque material is located only on the scribe areas of the first ultraviolet wavelength radiation transparent material. 
     
     
         7 . The template structure of  claim 4 , further comprising at least one alignment mark within the optically opaque material. 
     
     
         8 . The template structure of  claim 4 , wherein the optically opaque material extends continuously along the periphery of the first ultraviolet wavelength radiation transparent material. 
     
     
         9 . A template structure, comprising:
 an ultraviolet wavelength radiation transparent material having a planar surface opposing a patterned surface comprising recesses and protrusions; and   an optically opaque material in contact with only one of a periphery of the ultraviolet wavelength radiation transparent material and scribe areas of the ultraviolet wavelength radiation transparent material.   
     
     
         10 . The template structure of  claim 9 , wherein the optically opaque material is only located on an outer perimeter of the patterned surface of the ultraviolet wavelength radiation transparent material. 
     
     
         11 . The template structure of  claim 9 , wherein the optically opaque material is only located on the scribe areas of the patterned surface of the ultraviolet wavelength radiation transparent material. 
     
     
         12 . The template structure of  claim 9 , wherein the optically opaque material comprises at least one of chromium, chromium oxide, titanium, titanium nitride, and tungsten. 
     
     
         13 . The template structure of  claim 9 , wherein a thickness of the optically opaque material is within a range of from approximately 80 nanometers to approximately 100 nanometers. 
     
     
         14 . The template structure of  claim 9 , wherein the patterned surface of the ultraviolet wavelength radiation transparent material comprises at least one feature having a dimension of less than approximately 45 nm. 
     
     
         15 . The template structure of  claim 9 , further comprising another ultraviolet wavelength radiation transparent material bonded to the planar surface of the ultraviolet radiation transparent material. 
     
     
         16 . The template structure of  claim 15 , wherein the another ultraviolet wavelength is bonded to the ultraviolet wavelength radiation transparent material through an adhesive composition therebetween. 
     
     
         17 . A template structure, comprising:
 a first ultraviolet wavelength radiation transparent material comprising a patterned surface recesses and protrusions each having a feature dimension of less than approximately 45 nanometers; and   a second ultraviolet wavelength radiation transparent material bonded to a substantially planar surface of the first ultraviolet wavelength radiation transparent material opposing the patterned surface of the first ultraviolet wavelength radiation transparent material.   
     
     
         18 . The template structure of  claim 17 , wherein the second ultraviolet wavelength radiation transparent material is bonded to the substantially planar surface of the first ultraviolet wavelength radiation transparent material through an adhesive material having an index of refraction substantially similar to an index of refraction of the first ultraviolet wavelength radiation transparent material and to an index of refraction of the second ultraviolet wavelength radiation transparent material. 
     
     
         19 . The template structure of  claim 17 , wherein the first ultraviolet wavelength radiation transparent material and the second ultraviolet wavelength radiation transparent material comprise a substantially similar material composition. 
     
     
         20 . The template structure of  claim 16 , further comprising an optically opaque material on and limited to an outer perimeter of the first ultraviolet wavelength radiation transparent material.