Spinal system amd method including lateral approach

Abstract

Embodiments of the invention include devices and methods for implanting a vertebral body spacer. A lateral surgical approach is contemplated with some disclosed procedures. Instruments of some embodiments are insertable into a disc space to achieve distraction, to determine a desired disc space height, and to select a corresponding implant.

1 - 47 . (canceled) 
     
     
         48 . An implant positionable in a spinal disc space between an upper vertebra and a lower vertebra, comprising:
 a leading end portion, an opposite trailing end portion, and a longitudinal axis extending between the leading and trailing end portions;   an upper surface orientable toward the upper vertebra;   a lower surface orientable toward the lower vertebra;   an anterior sidewall extending between the leading end portion and the trailing end portion; and   a posterior sidewall arranged opposite the anterior sidewall and extending between the leading end portion and the trailing end portion,   wherein the implant includes a first rounded portion between the leading end portion and the anterior sidewall and a second rounded portion between the trailing end portion and the anterior sidewall.   
     
     
         49 . An implant as recited in  claim 48 , wherein the anterior sidewall is flat between the first and second rounded portions. 
     
     
         50 . An implant as recited in  claim 48 , wherein the upper surface is convexly curved between the leading end portion and the trailing end portion. 
     
     
         51 . An implant as recited in  claim 48 , wherein the lower surface is convexly curved between the leading end portion and the trailing end portion. 
     
     
         52 . An implant as recited in  claim 48 , wherein the leading end portion defines a nose that is rounded between the upper and lower surfaces and between the anterior and posterior sidewalls. 
     
     
         53 . An implant as recited in  claim 52 , wherein an inner surface of the implant defines a cavity that extends through the upper and lower surfaces. 
     
     
         54 . An implant as recited in  claim 53 , wherein the cavity is positioned between the leading end portion and the trailing end portion and between the anterior sidewall and the posterior sidewall. 
     
     
         55 . An implant as recited in  claim 53 , wherein at least one of the anterior sidewall and posterior sidewall comprise an opening extending therethrough, the opening being in communication with the cavity. 
     
     
         56 . An implant as recited in  claim 48 , wherein the implant comprises a radiolucent material. 
     
     
         57 . An implant as recited in  claim 56 , wherein the implant comprises at least one radiographic marker. 
     
     
         58 . An implant as recited in  claim 56 , wherein the implant comprises polyether ether ketone (PEEK) or a composite of PEEK. 
     
     
         59 . An implant as recited in  claim 56 , wherein the anterior sidewall has a maximum height defined by a distance between the upper and lower surfaces that is greater than that of the posterior sidewall. 
     
     
         60 . An implant as recited in  claim 48 , wherein:
 the anterior sidewall and the posterior sidewall each have a height defined by a distance between the upper and lower surfaces; and   an average height of the anterior sidewall is greater than an average height of the posterior sidewall.   
     
     
         61 . An implant positionable in a spinal disc space between an upper vertebra and a lower vertebra, comprising:
 a leading end portion, an opposite trailing end portion, and a longitudinal axis extending between the leading and trailing end portions;   an upper surface orientable toward the upper vertebra;   a lower surface orientable toward the lower vertebra;   an anterior sidewall extending between the leading end portion and the trailing end portion; and   a posterior sidewall arranged opposite the anterior sidewall and extending between the leading end portion and the trailing end portion,   wherein the anterior sidewall has a maximum height defined by a distance between the upper and lower surfaces that is greater than that of the posterior sidewall.   
     
     
         62 . An implant as recited in  claim 61 , wherein:
 the implant includes a first rounded portion between the leading end portion and the anterior sidewall and a second rounded portion between the trailing end portion and the anterior sidewall; and   the anterior sidewall is flat between the first and second rounded portions.   
     
     
         63 . An implant as recited in  claim 61 , wherein the upper and lower surfaces are each convexly curved between the leading end portion and the trailing end portion. 
     
     
         64 . An implant as recited in  claim 61 , wherein:
 the implant comprises a radiolucent material comprising polyether ether ketone (PEEK) or a composite of PEEK; and   the implant comprises at least one radiographic marker.   
     
     
         65 . An implant positionable in a spinal disc space between an upper vertebra and a lower vertebra, comprising:
 a leading end portion, an opposite trailing end portion, and a longitudinal axis extending between the leading and trailing end portions, the implant having a midpoint positioned equidistant from the leading end portion and the trailing end portion;   an upper surface orientable toward the upper vertebra;   a lower surface orientable toward the lower vertebra;   an anterior sidewall extending between the leading end portion and the trailing end portion; and   a posterior sidewall arranged opposite the anterior sidewall and extending between the leading end portion and the trailing end portion,   wherein the implant has a height defined by a distance between the upper and lower surfaces, the height being greater at the midpoint than at the leading end portion.   
     
     
         66 . An implant as recited in  claim 65 , wherein the anterior sidewall has a maximum height defined by a distance between the upper and lower surfaces that is greater than that of the posterior sidewall. 
     
     
         67 . An implant as recited in  claim 65 , wherein:
 the implant includes a first rounded portion between the leading end portion and the anterior sidewall and a second rounded portion between the trailing end portion and the anterior sidewall; and   the anterior sidewall is flat between the first and second rounded portions.