Strain and Kinetics Control During Separation Phase of Imprint Process

Abstract

Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.

What is claimed is: 
     
         1 . A method of separating an imprint lithography template from a solidified patterned layer formed on a substrate, the method comprising:
 applying, by a chuck connected to the template, pressure to the template;   applying, by an imprint head connected to the chuck; a force normal to the solidified layer to initiate separation of the template from the solidified layer;   controlling the force applied by the imprint head and pressure applied by the chuck, wherein such controlling limits lateral displacement of the template with respect to the substrate.   
     
     
         2 . The method of  claim 1  further comprising applying a predetermined pressure to the template prior to initiating separation. 
     
     
         3 . The method of  claim 1  further comprising applying partial vacuum pressure to the template. 
     
     
         4 . The method of  claim 1  wherein shearing stress on patterned layer features is minimized during separation.