Production method for ultra-high-purity ruthenium(ru) powder and target by using waste ruthenium(ru) targets

Abstract

The present invention is related to a method for manufacturing Ru powder and a target which are frequently used in a seed layer for forming a magnetic layer. When producing Ru powder and a target by using a conventional wet method, it takes terribly much time to produce powder and to perform dissolution of a waste target and it also required much expensive cost. Further, since large quantity of chemical products were used, an environmental pollution problem such as disposal of waste water was generated. Thus, the present invention is devised to solve such a drawback. In order to improve this problem, the present invention is characterized in that it simply removes surface pollutants and foreign substances on a surface of a waste Ru target by using a chemical method or a mechanical method, Ru is produced by using plasma, refined High purity Ru powder is produced through a heat process and pulverization, and a Ru target of high density by sintering is acquired.

1 . A method for manufacturing ultra high purity Ru powder and target by using waste Ru comprising,
 (a) a step for removing surface pollutants and foreign substances remaining on a surface of a waste Ru target by using a chemical method or a mechanical method;   (b) a step for producing Ru powder on waste Ru wherein surface pollutants and foreign substances are removed by using plasma;   (c) a step for producing high purity Ru powder on the produced Ru powder through a heat process and pulverization process;   (d) a step for Ru powder sinter of high density by applying a pressure molding of high temperature to high purity Ru powder;   (e) a step for producing Ru target wherein a surface roughness is controlled via a post-processing.   
     
     
         2 . The method for manufacturing ultra high purity Ru powder and target by using waste Ru according to the  claim 1 , wherein the chemical method or the mechanical method is employed in order to remove surface pollutants and foreign substances remaining on a surface of a waste Ru target. 
     
     
         3 . The method for manufacturing ultra high purity Ru powder and target by using waste Ru according to the  claim 2 , wherein NaCLO solution or solution including NaClO is employed as the chemical method to remove surface pollutants and foreign substances remaining on a surface of a waste Ru target. 
     
     
         4 . The method for manufacturing ultra high purity Ru powder and target by using waste Ru according to the  claim 2 , wherein a lathe and a grinding processing is employed as the mechanical method to remove surface pollutants and foreign substances remaining on a surface of a waste Ru target. 
     
     
         5 . The method for manufacturing ultra high purity Ru powder and target by using waste Ru according to the  claim 1 , wherein a material of a mold in the step for producing Ru powder by using plasma is any one selected from graphite, copper (Cu), molybdenum (Mo), tungsten (W) or Ruthenium (Ru). 
     
     
         6 . The method for manufacturing ultra high purity Ru powder and target by using waste Ru according to the  claim 1 , wherein a material of an electrode in the step for producing Ru powder by using plasma is any one selected from molybdenum (Mo), tungsten (W) or Ruthenium (Ru). 
     
     
         7 . The method for manufacturing ultra high purity Ru powder and target by using waste Ru according to the  claim 1 , wherein one or more gases selected from Ar, H 2 , N 2 , or CH 4  are employed when producing the plasma. 
     
     
         8 . The method for manufacturing ultra high purity Ru powder and target by using waste Ru according to the  claim 1 , wherein an atmospheric heat process or a hydrogen heat process is employed as a heat process of Ru powder manufactured by using the plasma so that high purity Ru powder can be obtained. 
     
     
         9 . The method for manufacturing ultra high purity Ru powder and target by using waste Ru according to the  claim 8 , wherein the atmospheric heat process is performed under 800-1000° C. for 1-5 hours. 
     
     
         10 . The method for manufacturing ultra high purity Ru powder and target by using waste Ru according to the  claim 8 , wherein the hydrogen heat process is performed under 800-1000° C. for 1-5 hours. 
     
     
         11 . The method for manufacturing ultra high purity Ru powder and target by using waste Ru according to the  claim 1 , wherein pulverizing Ru powder manufactured by using the plasma is performed by any one selected from Ball Mill, Planetary Mill or Jet Mill. 
     
     
         12 . The method for manufacturing ultra high purity Ru powder and target by using waste Ru according to the  claim 1 , wherein the high temperature pressure molding is performed by any one selected from Hot Press, Hot Isostatic Press, or Spark Plasma Sintering.